Multi-Wavelength Interferometry for Shallow Depth Profiling
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Solution Overview
Problem
Existing methods for determining the depth profile of surface structures, such as semiconductor layers, using interferometric effects face limitations in precision and accuracy, especially for shallow depths, due to the reliance on single wavelengths and the inability to effectively control etching processes with high precision.
Innovation Solution
The method involves irradiating the surface structure with light components of different wavelengths to generate trend curves, using light component weighting factors determined through principal component analysis to optimize the occurrence of extreme values and turning points, thereby enhancing precision and compensating noise and drift components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If single wavelength light is used for interferometric measurement, then the measurement system is simple, but the measurement precision for shallow depths is insufficient
Solution Approach 1:
The patent segments the measurement process by using multiple discrete wavelength components instead of a continuous spectrum. Each wavelength provides independent interferometric measurements that are combined to achieve high precision depth profiling, particularly for shallow depths where single wavelength methods fail.
Solution Approach 2:
The patent transitions from single-wavelength (one-dimensional) interferometry to multi-wavelength (multi-dimensional) interferometry. By adding the wavelength dimension to the measurement space, the system achieves enhanced sensitivity and precision for shallow depth measurements without proportionally increasing system complexity.
2Measurement precision
If multiple wavelengths are used to improve precision, then the measurement accuracy increases, but the signal-noise ratio deteriorates
Solution Approach 1:
The patent implements feedback through iterative optimization of wavelength combinations. The system analyzes interferometric signals from multiple wavelengths, identifies noise and drift patterns, and adjusts the weighting of different wavelength components to maximize signal quality and minimize noise impact in the final depth profile.
Solution Approach 2:
The patent creates a composite measurement signal by combining interferometric data from multiple wavelength components. Each wavelength contributes specific information, and their weighted combination produces a composite signal that enhances precision while allowing noise filtering through the complementary nature of different wavelength responses.
3Manufacturing precision
If traditional interferometric methods are used, then the system is easy to operate, but the control precision of surface structure formation is insufficient
Solution Approach 1:
The patent enables self-service operation through automated multi-wavelength interferometric analysis. The system automatically processes signals from multiple wavelengths, performs depth profile calculations, and provides real-time feedback for surface structure formation control without requiring complex manual intervention, maintaining ease of operation while achieving high manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for high-precision depth profile determination with improved signal-noise ratio, enabling better control of surface structure formation and reducing the distance to target depth, even for shallow profiles, without the need for expensive hardware modifications.
Implementation Method 1
determining a depth profile of a surface structure using interferometric effects
Implementation Method 2
The irradiation light is reflected at the surface structure, thereby (at least partially) being converted into reflection light
Data Source
AI summary
According to one embodiment of the present invention, a method of determining the depth profile of a surface structure includes: irradiating the surface structure with irradiation light including light components of different wavelengths; and determining the depth profile of the surface structure in dependence on interferometric effects caused by the reflection of the irradiation light at the surface structure.


