Multi-Zone Gas Assembly for Substrate Transfer Contamination
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Solution Overview
Problem
In electronic device manufacturing systems, particulate matter from chamber hardware migrates during substrate transfer, contaminating substrates and increasing defects, necessitating a solution to prevent contamination during substrate processing and transfer between process chambers.
Innovation Solution
A gas assembly with a manifold having multiple, independently controlled plenums and nozzles is introduced, providing customizable cross-flow distribution into the process chamber, coupled to the mainframe door and process chamber, ensuring controlled gas flow and minimizing contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a chamber port assembly with slit valve is used for substrate transfer, then substrate transfer between chambers is enabled, but particulate matter from chamber hardware migrates and contaminates the substrate
Solution Approach 1:
The patent introduces an intermediary gas flow system between the chamber port assembly and substrate to prevent particulate contamination. Gas nozzles deliver controlled gas flows that create a protective barrier, allowing substrate transfer while repelling or trapping particulate matter before it reaches the substrate surface.
Solution Approach 2:
The patent employs pneumatic gas delivery systems with controlled flow rates to create protective gas curtains during substrate transfer. The gas flow dynamics are engineered to counteract particulate migration while maintaining transfer functionality, using pressure-controlled gas streams to shield the substrate.
2Object-affected harmful factors
If gas flow is increased to prevent contamination, then substrate protection improves, but control over mass flow for sensitive chemical processes deteriorates
Solution Approach 1:
The patent segments the gas delivery system into multiple independently controlled zones or nozzles, each capable of delivering specific gas flows. This segmentation allows precise control over total mass flow while directing protective gas flows to specific areas where contamination protection is needed, without disrupting sensitive chemical processes in other zones.
Solution Approach 2:
The patent implements dynamic control of gas flow parameters, allowing real-time adjustment of flow rates, pressures, and distribution patterns. This dynamic capability enables the system to provide enhanced protection during substrate transfer operations while maintaining precise mass flow control during sensitive chemical processing, adapting to different process stages.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution provides improved control over mass flow for sensitive chemical processes, reducing substrate defects by maintaining a clean processing environment and allowing for uniform or non-uniform gas flow, enhancing repeatability and tunability across various processes.
Implementation Method 1
Each of the plenums include one or more nozzles in fluid communication with a bottom surface of the opening and the opening of the second major surface
Implementation Method 2
Each of the one or more plenums is coupled to respective flow control valves
Data Source
AI summary
Embodiments described herein generally relate to a gas assembly disposed between a mainframe door and process chamber. The gas assembly provides multi-zone gas cross-flow distribution into a processing volume. Each of the zones are independently controlled. The zones each include a single nozzle, the zones each include a plenum fluidly coupled to multiple nozzles, or a combination thereof. The nozzles, such as plenums included with nozzles, are disposed within the manifold between the first major surface and the second major surface of the manifold. An outlet of the nozzles are in fluid communication with the second major surface of the manifold, and in fluid communication with a volume of the process chamber. The multiple, independently controlled zones provide controllability of mass flow for flow sensitive chemical processes. The gas assembly include an adapter plate configured to be coupled to a vacuum mainframe robot.