Multi-Zone Showerhead Structure for Uniform Plasma Substrate Treatment
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Solution Overview
Problem
In semiconductor manufacturing, there is a challenge in achieving uniformity in the treatment process of larger substrates using plasma, particularly in etching and deposition processes, where process uniformity is critical.
Innovation Solution
A showerhead structure with an inner and outer zone separated by a partitioning wall, featuring independent channels for gas and plasma supply, allows for controlled and uniform distribution of gases and radicals to the substrate, minimizing exposure to plasma and ensuring uniform thin film synthesis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single-zone showerhead is used for substrate treatment, then the device structure is simple, but the process uniformity across the substrate deteriorates
Solution Approach 1:
The showerhead is divided into multiple independent zones (inner zone and outer zone) with separate gas supply channels and flow control mechanisms. Each zone can independently control gas flow rate and composition, enabling differentiated treatment conditions across different regions of the substrate to achieve uniform processing results.
2Quantity of substance
If plasma is supplied uniformly across the substrate, then the treatment coverage is complete, but the uniformity of thin film synthesis deteriorates due to excessive ion exposure
Solution Approach 1:
Different zones of the showerhead provide different plasma conditions tailored to local substrate requirements. The inner zone and outer zone can have different gas flow rates, plasma densities, and ion fluxes, allowing optimization of thin film synthesis quality in each region while maintaining overall coverage.
3Productivity
If gas flow rate is increased to improve deposition speed, then the productivity increases, but the uniformity of gas distribution deteriorates
Solution Approach 1:
The system employs dynamic flow control through independent mass flow controllers for each zone, allowing real-time adjustment of gas flow rates to maintain optimal distribution uniformity while achieving high deposition speeds. The multi-zone configuration enables compensatory adjustments across different regions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves high-quality thin film synthesis with uniform thickness distribution and a wide process window by isolating gas zones and controlling flow rates, enabling the production of materials with ultra-low dielectric constants like amorphous boron nitride.
Implementation Method 1
a plasma generator configured to supply plasma to the ion blocker and a chamber under the showerhead
Implementation Method 2
The plasma generator is configured to generate ions that are removed by the ion blocker, such that radicals in the plasma are supplied to the treating space
Implementation Method 3
A plurality of first holes is in the inner zone, and a plurality of second holes is in the outer zone... The inner zone is configured to receive a first gas which is supplied to the treating space through the plurality of first holes
Implementation Method 4
In the treating space, in use, the borazine and the radicals react each other to produce amorphous boron nitride (a-BN)
Implementation Method 5
the substrate treating apparatus is used to treat a substrate such as a semiconductor wafer using plasma... in a recent semiconductor manufacturing process, the substrate such as a semiconductor wafer is becoming larger
Data Source
AI summary
A showerhead structure comprises a showerhead including an inner zone, an outer zone, and a partitioning wall therebetween and configured to isolate the inner zone and the outer zone from each other. A first plate is on top of the showerhead and includes a distributor. A plurality of first holes is in the inner zone, and a plurality of second holes is in the outer zone. A plurality of columns in each of the inner zone and the outer zone each extending toward the first plate and having a third hole and a first fluid passage connected to the third hole therein. A space under the showerhead receives a fluid through the first fluid passage and the third hole, the space under the showerhead receives a first gas through the first hole, and the space under the showerhead is configured to receive a second gas through the second hole.