Multi-Beam Blanking Control for Thermal-Stable Pattern Writing
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Solution Overview
Problem
The temperature fluctuations of the blanking aperture array substrate in multi-beam writing apparatuses lead to deformation of the shaping aperture array substrate, affecting writing accuracy due to beam position fluctuations, and existing cooling systems fail to stabilize the temperature consistently.
Innovation Solution
Implement a method where irradiation time control data is transferred during both beam irradiation and non-irradiation periods, using a blanking controller to manage beam states, thereby stabilizing the operating currents and temperature of the blanking aperture array substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If data transfer to the blanking aperture array substrate is performed only during beam irradiation periods, then the control circuit operates intermittently causing temperature fluctuations, but this leads to deformation of the shaping aperture array substrate and beam position fluctuations
Solution Approach 1:
The patent applies periodic action by transferring control data during both beam irradiation and non-irradiation periods in a cyclic manner. This periodic data transfer keeps the control circuit continuously operating at a stable current level, preventing temperature fluctuations of the blanking aperture array substrate, which in turn prevents deformation of the shaping aperture array substrate and maintains writing accuracy
Solution Approach 2:
The patent implements continuity of useful action by ensuring the control circuit operates continuously without interruption. By transferring control data during both beam irradiation and non-irradiation periods, the circuit maintains a constant operating state and temperature, eliminating the intermittent operation that would cause thermal fluctuations and subsequent positioning errors
2Temperature
If data transfer is increased to maintain continuous circuit operation, then temperature stability improves, but the complexity of the control system increases
Solution Approach 1:
The patent applies universality by making the data transfer system multi-functional. The same data transfer mechanism serves dual purposes: it controls beam blanking during irradiation periods and simultaneously maintains circuit operation during non-irradiation periods. This eliminates the need for separate systems and reduces overall control system complexity while achieving temperature stability
3Temperature
If cooling system is installed to stabilize temperature, then temperature control is attempted, but it fails to consistently stabilize the shaping aperture array substrate temperature
Solution Approach 1:
The patent converts the potentially harmful effect of continuous data transfer (which would normally cause overheating) into a beneficial effect. By transferring data during both beam irradiation and non-irradiation periods, the control circuit maintains a constant, moderate operating temperature rather than fluctuating, thereby preventing the deformation of the shaping aperture array substrate without requiring additional cooling systems
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Stabilizes the temperature of the shaping aperture array substrate, reducing beam position fluctuations and improving writing accuracy and throughput by maintaining consistent radiation heat.
Implementation Method 1
The blanking aperture array substrate has electrode pairs (blankers) for individually deflecting beams, and includes an opening for beam passage between each electrode pair. Blanking deflection is performed on the passing electron beam by controlling the electrode pair at the same electrical potential or at different electrical potentials.
Implementation Method 2
Even with a cooling system installed to cool the shaping aperture array substrate, it has been difficult to stabilize the temperature of the shaping aperture array substrate.
Implementation Method 3
the temperature of the blanking aperture array substrate increases due to the current flowing through the control circuit in response to data transfer
Implementation Method 4
when the temperature of the blanking aperture array substrate increases, a shaping aperture array substrate is deformed by the radiation heat
Data Source
AI summary
In one embodiment, a multiple charged-particle beam writing method includes emitting multiple charged-particle beams, switching predetermined beams of the multiple charged-particle beams between on and off using a plurality of blankers provided on a blanking aperture array substrate, and transferring, while moving a stage installed in a writing chamber, control data for on-off control of each beam of the multiple charged-particle beams to a control circuit of the blanking aperture array substrate to irradiate a writing target substrate placed on the stage with the multiple charged-particle beams based on the control data and write a pattern. The control circuit is operated during a period of beam non-irradiation in which the writing target substrate is not irradiated with the multiple charged-particle beams.