Multi-Beam Writing Block Regions for Border Position Deviation
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Solution Overview
Problem
The existing multi-beam writing technique for semiconductor devices faces challenges with increased position deviation at the borders between stripe regions, leading to longer writing times due to the need for increased maximum irradiation time to accommodate larger dose modulation amounts.
Innovation Solution
A multi-charged particle beam writing apparatus and method that forms block regions from sub-regions within the irradiation area, allowing for writing without overlapping by using these block regions, thereby reducing position deviation and optimizing writing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the maximum modulation amount of dose is increased to correct position deviation at stripe region borders, then the position deviation correction capability is improved, but the maximum irradiation time per shot needs to be increased, resulting in increased writing time
Solution Approach 1:
The patent divides the irradiation region into multiple block regions, each surrounded by a different number of beams. This segmentation allows for localized dose modulation strategies that reduce the maximum modulation amount needed while maintaining position deviation correction capability. By treating different regions with different beam configurations, the system avoids the need to increase maximum irradiation time across the entire writing field.
2Productivity
If multiple beams are used to increase writing throughput, then the productivity is improved, but the position deviation at stripe region borders increases, requiring longer irradiation time
Solution Approach 1:
The patent applies different beam configurations to different spatial locations by creating block regions with varying numbers of surrounding beams. This local quality approach allows the system to maintain high throughput with multiple beams while locally optimizing position deviation correction in border regions without requiring increased irradiation time.
3Ease of manufacture
If the irradiation region is divided into stripe regions for systematic writing, then the writing process organization is improved, but the position deviation increases at the borders between stripe regions
Solution Approach 1:
The patent further segments each stripe region into multiple block regions with different beam surround configurations. This additional segmentation level allows the system to maintain the organizational benefits of stripe regions while eliminating border position deviation issues by creating transition zones between blocks that accommodate positional variations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively minimizes the maximum position deviation amount, reducing writing time and improving throughput by dividing the beam array into block regions for controlled irradiation, thus addressing the inefficiencies in existing multi-beam writing methods.
Implementation Method 1
a beam forming mechanism configured to form multiple charged particle beams
Data Source
AI summary
A multi-charged particle beam writing apparatus includes a beam forming mechanism to form multi-charged-particle-beams, a block region forming circuit to form plural block regions from an irradiation region of the multi-charged-particle-beams formed by combining plural sub-regions each surrounded by a beam, being different from each other, and plural other beams adjacent to the beam in the multi-charged-particle-beams, and a writing mechanism to perform, using the multi-charged-particle-beams, multiple writing such that irradiation of each block region of the plural block regions is at least performed by any one of writing processing of the multiple writing, and such that each writing processing of the multiple writing is performed to write a writing region of a target object in a manner of covering the writing region without overlapping by, using one of the plural block regions, irradiation of the one of the plural block regions.