Multi-Beam Exposure Dose Correction for CD Deviation Control
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Solution Overview
Problem
Multi-beam exposure devices face challenges in accurately adjusting the dose amount of beams to minimize pattern size dispersion during the exposure process for display device manufacturing, as existing methods fail to effectively account for the variation in critical dimension deviations across different beam combinations.
Innovation Solution
A correction method is introduced that generates relational expressions between the gray level of edge beams and pattern size variations, forming a matrix equation to derive optimal dose amounts for each beam, allowing for individual dose adjustments based on measured deviation amounts, thereby minimizing critical dimension deviations and pattern size distribution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the dose amount of beams is adjusted to reduce pattern size dispersion, then manufacturing precision is improved, but device complexity increases due to the need for individual beam correction
Solution Approach 1:
The patent changes the parameters of individual beams (dose amount, gray level) based on measured deviation amounts. By adjusting each beam's parameters individually according to the matrix equation solution, the system achieves precise pattern size control without requiring complex hardware modifications, thus improving manufacturing precision while managing device complexity through software-based parameter optimization.
Solution Approach 2:
The patent implements a feedback mechanism where deviation amounts of critical dimensions are measured, fed into a matrix equation, and used to calculate optimal dose amounts for each beam. This closed-loop feedback system continuously optimizes beam parameters to minimize pattern size dispersion, resolving the contradiction by using intelligent control rather than complex hardware to achieve high precision.
2Manufacturing precision
If individual beam correction is implemented, then manufacturing precision is improved, but measurement and detection difficulty increases
Solution Approach 1:
The patent segments the overall exposure process into individual beam contributions, measuring and correcting each beam's deviation amount separately. By dividing the complex multi-beam system into manageable individual beam units, the measurement and detection process becomes more systematic and less difficult, while still achieving high manufacturing precision through cumulative correction of all beams.
Solution Approach 2:
The patent introduces an intermediary mathematical model (matrix equation) that connects measured deviation amounts to optimal dose amounts. This intermediary model simplifies the complex relationship between multiple beams and pattern outcomes, making measurement and detection more manageable by providing a clear computational pathway from measurement to correction.
3Productivity
If multi-beam combinations are used to adjust pattern width and size, then productivity is improved, but manufacturing precision deteriorates due to increased pattern size variation
Solution Approach 1:
The patent applies feedback control to multi-beam combinations by measuring actual pattern outcomes and adjusting individual beam doses accordingly. This allows the system to maintain the productivity benefits of multi-beam parallel processing while compensating for precision losses through real-time correction based on measured deviations, thus resolving the contradiction between speed and accuracy.
Solution Approach 2:
The patent dynamically changes parameters (dose amounts) of individual beams within multi-beam combinations based on measured performance. This enables the system to optimize both productivity and precision by adjusting beam parameters to minimize pattern size variation while maintaining efficient parallel processing, rather than using fixed parameter settings.
Data Source
AI summary
A correction method may include generating a first function that is a relational expression between a gray level of an edge beam among beams and a variation amount in size of a pattern according to a second beam adjacent to the edge beam, obtaining a second function that is a relational expression between the first function, the gray level of the edge beam, and a variation amount in a deviation amount of a CD and the deviation amount of the CD according to each of the beams, generating a matrix equation by adding all of second functions according to multi-beam combinations in which the beams are differently combined, deriving a solution of the matrix equation by measuring the deviation amount of the CD, and deriving an optimal dose of each of the beams by using the solution of the matrix equation.