Multi-Beam Dose Distribution for Faster Charged Particle Writing

The patent segments the correction task by dividing beams into groups based on their position deviation characteristics. Instead of uniformly applying dose modulation to all beams, the system selectively applies correction only to beams that require it, based on their actual irradiation position relative to the control grid. This segmentation reduces the overall modulation rate while maintaining position accuracy.

The patent implements local quality by applying different dose modulation strategies to different beams based on their specific position deviation. Beams with small position deviations receive no correction or minimal correction, while only beams with significant deviations undergo dose modulation. This localized approach reduces the maximum modulation rate across the entire beam array while still correcting position accuracy where needed.

The patent segments the beam array into multiple groups based on position deviation magnitude. By identifying which beams fall within acceptable tolerance ranges and which require correction, the system avoids applying uniform dose modulation to all beams. This segmentation simplifies the modulation rate profile by creating distinct zones of correction intensity.

The patent applies partial action by selectively correcting only the necessary subset of beams rather than all beams. By determining which beams have position deviations exceeding a threshold and correcting only those, the system achieves position accuracy without the excessive modulation rates that would result from universal correction.