Multibeam Drawing Device Irradiation Time Optimization
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Solution Overview
Problem
Current multibeam drawing devices for semiconductor manufacturing require further reduction in beam irradiation time to enhance throughput during the downscaling of semiconductor devices, as the circuit line width decreases and LSI density increases, necessitating improved control over electron beam irradiation in the lithography process.
Innovation Solution
A drawing device and method that utilize a stage, aperture member, data generator, calculator, and controller to generate and control irradiation time data with n bits for each coordinate position of multiple beams, performing logical addition operations to optimize beam irradiation times and control the aperture member accordingly, thereby reducing unnecessary beam irradiation and improving throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple beams are used to irradiate the mask blank simultaneously, then the throughput is improved, but the beam irradiation time cannot be reduced further
Solution Approach 1:
The patent segments the beam irradiation process into multiple passes, where a single beam irradiates different regions sequentially. The aperture array is moved to different positions in each pass, allowing the same multiple-beam aperture structure to serve multiple spatial regions without requiring simultaneous operation of all beams, thus reducing the irradiation time per beam while maintaining overall throughput.
Solution Approach 2:
The patent introduces dynamic movement of the aperture array between different positional settings. By moving the aperture array to different positions for different irradiation passes, the system dynamically reconfigures which beams are active and where they irradiate, enabling time-multiplexed operation that reduces the total irradiation time while preserving the throughput benefits of multiple beams.
2Manufacturing precision
If the circuit line width is downscaled to increase LSI density, then the manufacturing precision is improved, but the beam irradiation time increases
Solution Approach 1:
The patent divides the mask blank into multiple irradiation regions and uses a single beam to sequentially irradiate each region by moving the aperture array. This segmentation allows precise control over each irradiation zone, maintaining the required manufacturing precision for downscaled circuit lines while reducing total irradiation time compared to using multiple beams simultaneously.
Solution Approach 2:
The patent implements continuous irradiation by moving the aperture array between positions without stopping the beam source. The single beam continuously irradiates different regions as the aperture array moves, eliminating idle time between beam activations and maintaining continuous useful action, thus reducing total irradiation time while preserving precision through controlled positioning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces beam irradiation time and enhances throughput by optimizing beam control and irradiation patterns, allowing for more precise and efficient patterning of semiconductor devices during the lithography process.
Implementation Method 1
a photomask is formed by irradiating electron beams to a mask blank to draw a mask pattern
Data Source
AI summary
A drawing device according to an embodiment includes: a stage configured to be capable of having a processing target mounted thereon; an aperture member including a plurality of apertures corresponding to a plurality of beams irradiated to the processing target; a data generator configured to generate gradation data indicating irradiation time data with n bits (n is a positive integer) with respect to positions of respective coordinates of the beams; a calculator configured to perform a logical addition operation of the gradation data of the respective positions of the coordinates; and a controller configured to control the aperture member based on the gradation data and a result of the logical addition operation.