3D Multibeam Focus Generation With Depth-Adaptive Wavefronts
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Solution Overview
Problem
Existing photon beam focusing technologies are limited in their ability to generate multiple foci with defined optical quality across various materials and depths, often requiring sequential focusing and being restricted by technical limitations in throughput and adaptability to different materials and refractive indices.
Innovation Solution
A device that splits a photon beam into multiple component beams, allowing simultaneous focusing at a predetermined focal depth with adaptable wavefronts to ensure consistent optical quality across different depths, using components like deformable mirrors and spatial light modulators to adjust wavefronts based on focal depth.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If sequential focusing is used to generate multiple foci, then system complexity is reduced, but productivity decreases due to time restrictions
Solution Approach 1:
The photon beam is segmented into multiple component beams using a beam splitting device, allowing simultaneous generation of multiple foci. Each component beam can be independently focused to a different position within the material, enabling parallel processing without increasing overall system complexity
Solution Approach 2:
The patent extends focusing capability from a single focal plane to three-dimensional space by enabling independent focal depth control for each component beam. This allows foci to be positioned at different depths (z-coordinate) and lateral positions (x-y coordinates), creating a 3D focus distribution that increases productivity without proportionally increasing device complexity
2Adaptability or versatility
If focusing is performed at different focal depths, then versatility is improved, but manufacturing precision deteriorates due to optical quality variations
Solution Approach 1:
Each component beam is assigned a customized wavefront adaptation tailored to its specific focal depth and target position. The wavefront adapting device applies location-specific optical corrections, ensuring that each focus maintains optimal optical quality regardless of its depth within the material. This local optimization approach maintains manufacturing precision across the entire focal depth range
3Manufacturing precision
If wavefront adaptation is applied to each component beam, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
A single wavefront adapting device is designed to handle multiple component beams simultaneously, applying independent wavefront corrections to each beam. This universal device performs the function of multiple individual wavefront adaptors, maintaining manufacturing precision for all foci while avoiding the need for separate adaptation mechanisms for each beam, thus limiting the increase in device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables parallel generation of multiple foci with consistent optical quality across the entire depth of a material, significantly reducing processing time and improving throughput, particularly beneficial for applications like lithography and microfluidic device manufacturing.
Implementation Method 1
a means for adapting the wavefronts of the component beams based at least in part on the focal depth
Implementation Method 2
using components like deformable mirrors and spatial light modulators to adjust wavefronts based on focal depth
Implementation Method 3
a means for focusing the component beams at a predetermined focal depth within the material
Data Source
Figure 1a~1b
Figure 2
Figure 3
AI summary
The invention relates to a device for focusing a photon beam into a material. The device comprises: means for splitting the photon beam into a plurality of component beams; means for focusing the component beams at a predetermined focal depth within the material; means for adapting the wavefronts of the component beams based at least in part on the focal depth.