Multi-Beam Writing Grid Shifts for Legacy Pattern Reproduction
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Solution Overview
Problem
High-precision writing apparatuses face challenges in reproducing patterns with precision equivalent to low-precision writing apparatuses without hardware replacement, leading to potential discrepancies in pattern shape when using previous generation writing data.
Innovation Solution
A method and apparatus that shift the relative positions of writing grids from an ideal grid arrangement to intentionally introduce blur and line edge roughness, allowing high-precision writing apparatuses to replicate low-precision patterns by adjusting dose distribution and grid positions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a high-precision writing apparatus uses previous generation writing data, then writing throughput is maintained, but pattern shape precision deteriorates
Solution Approach 1:
The patent changes the parameters of the writing grid positions from ideal precise positions to intentionally shifted positions. By adjusting the grid position parameters to include controlled deviations, the system reproduces the blur characteristics of low-precision apparatuses while maintaining high-precision hardware, thus resolving the contradiction between throughput and pattern precision
Solution Approach 2:
The patent performs preliminary adjustment of the writing grid positions before actual pattern writing. By pre-calculating and setting the shifted grid positions that account for desired blur effects, the system prepares the high-precision apparatus to reproduce low-precision results, allowing maintenance of both throughput and controlled precision
2Measurement precision
If writing grids are arranged at ideal even pitch, then writing precision is maximized, but pattern blur is insufficient for low-precision reproduction
Solution Approach 1:
The patent introduces asymmetry by deliberately shifting writing grid positions from their ideal symmetric even-pitch arrangement. This asymmetric positioning creates the desired blur effects and line edge roughness that characterize low-precision writing, while the underlying grid structure maintains sufficient organization for controlled reproduction
3Productivity
If multiple beams are used for writing, then writing throughput is increased, but beam resolution and precision deteriorate
Solution Approach 1:
The patent applies local quality by treating each beam position within the multiple beam system individually. By selectively shifting specific writing grids and applying position-dependent corrections to individual beams, the system maintains high resolution where needed while introducing blur where required, thus resolving the contradiction between multi-beam throughput and beam resolution
Data Source
AI summary
According to one aspect of the present invention, a multi-charged particle beam writing method includes setting, in a writing region on a target object, a plurality of writing grids in which relative positions of at least a portion of the plurality of writing grids are shifted from a plurality of ideal grids arranged at an even pitch in a gridded shape, and writing, using multiple beams, a pattern on the target object such that the plurality of writing grids in which the relative positions of the at least the portion of the plurality of writing grids are shifted are irradiated.