Multi-Beam Particle Microscope Compensation for Aperture Plate Drift
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Solution Overview
Problem
Multi-beam particle microscopes face challenges in maintaining high resolution and accuracy during operation due to deformations, contaminations, and degradations of multi-aperture plates, which affect the positioning and shape of individual beams, leading to deviations and aberrations.
Innovation Solution
A multi-beam particle microscope equipped with a control unit and measuring apparatuses to monitor and predict the deformation, contamination, or degradation of multi-aperture plates, allowing for real-time compensation of beam effects and ensuring consistent imaging properties through active multi-aperture plates and compensation elements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multi-aperture plates are used to generate multiple individual beams simultaneously for high throughput inspection, then productivity is improved, but the multi-aperture plates undergo deformations, contaminations, and degradations during operation that worsen manufacturing precision
Solution Approach 1:
The patent applies preliminary action by predicting deformations, contaminations, and degradations of multi-aperture plates before they significantly degrade beam quality. The control unit continuously monitors parameters of the multi-aperture plates and predicts future states, allowing the system to take compensatory actions in advance to maintain beam positioning accuracy and imaging properties throughout the operational lifespan of the plates.
2Productivity
If multi-aperture plates operate for extended periods to maintain high throughput, then productivity is improved, but the operational lifespan is limited by accumulating deformations and contaminations that degrade imaging properties
Solution Approach 1:
The patent implements feedback by continuously monitoring parameters of the multi-aperture plates during operation and using this information to predict future deformations, contaminations, and degradations. The control unit adjusts system parameters and activates compensation mechanisms based on these predictions, creating a closed-loop system that maintains imaging properties throughout the operational lifespan of the plates and enables timely replacement before performance degradation occurs.
3Manufacturing precision
If compensation mechanisms are added to correct beam deviations caused by plate deformations, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent applies parameter changes by using the control unit to adjust system parameters dynamically based on monitored and predicted states of the multi-aperture plates. Instead of adding complex mechanical compensation mechanisms, the system modifies operational parameters such as beam energy, aperture plate positioning, and detection parameters to compensate for deformations and maintain imaging properties, thereby reducing device complexity while preserving precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system maintains high throughput and accuracy by anticipating and compensating for beam deviations, extending the operational lifespan and ensuring uniformity and isotropy of imaging properties.
Implementation Method 1
a particle source (301) for generating a particle beam (309)
Implementation Method 2
an objective lens (102) which during operation generates a multiplicity of focus points (5) of the multiplicity of individual beams (3) in an image plane (101)
Data Source
AI summary
A multi-beam particle microscope with a micro-optical unit for generating the multiplicity of individual beams is disclosed. The micro-optical unit comprises a mechanism for setting and maintaining an unchanging imaging property of the multiplicity of individual beams. In one example, the micro-optical unit comprises at least one measuring apparatus used to sense a change in length, a change in distance, a contamination or degradation of a component of the micro-optical unit during operation. A multi-beam particle microscope comprises a control unit which establishes an effect on at least one individual beam from a change in length, a change in distance, a contamination or degradation of the component. A multi-beam particle microscope also comprises a compensation element for compensating the effect on the at least one individual beam. According to a method for operating a multi-beam particle microscope, a remaining service life of the multi-beam particle microscope which meets a demand with respect to a wafer inspection is also established.