Multi-Beam Charged Particle Optics With Insulated Shielding
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Solution Overview
Problem
Charged particle beam inspection techniques face low throughput due to interactions among charged particles, such as the Coulomb effect, which affects the resolution and efficiency of pattern inspection in device manufacturing processes.
Innovation Solution
The apparatus employs a multi-beam system with optics elements and electrically conductive layers to form paths for charged particles, using an electrically insulating layer to reduce crosstalk and field distribution deformation, and includes a detector to capture signals from interactions with the sample, enhancing the inspection process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a single beam of charged particles is used for inspection, then the apparatus structure is simple, but the inspection throughput is low
Solution Approach 1:
The patent divides a single charged particle beam into multiple parallel beams using a beam splitter or array of electron lenses. This segmentation allows simultaneous inspection of multiple areas on the substrate, thereby increasing throughput while maintaining a relatively compact apparatus structure through the use of integrated optics elements
Solution Approach 2:
The patent transitions from a single-dimensional beam path to a multi-dimensional beam array by spatially distributing multiple beams across different locations. This dimensional expansion enables parallel inspection without proportionally increasing the longitudinal apparatus length, thus improving throughput while controlling structural complexity
2Productivity
If multiple beams of charged particles are used to increase throughput, then the inspection efficiency improves, but interactions among charged particles (Coulomb effect) increase, degrading resolution
Solution Approach 1:
The patent applies different optical properties to different regions of the beam system. Each beam in the array is independently controlled with localized optics elements, allowing optimization of beam spacing and focusing to minimize Coulomb interactions in high-density regions while maintaining inspection capability. This local optimization preserves resolution while enabling multi-beam operation for improved throughput
Solution Approach 2:
The patent introduces electrostatic lenses and shielding structures as intermediary elements between the charged particle beams and the detection system. These intermediaries control beam trajectories and spacing, reducing direct Coulomb interactions between beams while maintaining the parallel beam configuration necessary for high throughput inspection
3Reliability
If electrically conductive layers are added to house optics elements, then the structural support and electrical shielding improve, but the device complexity increases
Solution Approach 1:
The patent designs the electrically conductive layers to serve multiple functions simultaneously: providing structural support for the optics elements, acting as electrical shields to prevent charge accumulation, and serving as alignment references for the beam paths. This multi-functionality reduces the need for separate components, thereby improving reliability without proportionally increasing device complexity
Solution Approach 2:
The patent merges the structural support function and electrical shielding function into a single integrated conductive layer structure. Rather than using separate support frames and shielding layers, the conductive layers are designed to perform both roles, simplifying the overall device architecture while maintaining the necessary reliability for multi-beam operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration improves the throughput and resolution of charged particle beam inspection by minimizing interactions among charged particles, allowing for more efficient scanning and detection of patterns on substrates and patterning devices.
Implementation Method 1
a plurality of optics elements between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles
Implementation Method 2
an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer
Implementation Method 3
a detector configured to capture a signal produced from an interaction of the beams and a sample
Data Source
Figure 1A
Figure 1B
Figure 1C
AI summary
Disclosed herein is an apparatus comprising: a first electrically conductive layer; a second electrically conductive layer; a plurality of optics element s between the first electrically conductive layer and the second electrically conductive layer, wherein the plurality of optics elements are configured to influence a plurality of beams of charged particles; a third electrically conductive layer between the first electrically conductive layer and the second electrically conductive layer; and an electrically insulating layer physically connected to the optics elements, wherein the electrically insulating layer is configured to electrically insulate the optics elements from the first electrically conductive layer, and the second electrically conductive layer.