Multi-Beam Charged Particle Optics for Secondary Beam Alignment

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Solution Overview

Problem

Existing charged particle beam devices face challenges in reducing positional shifts between secondary beams generated in the beam separator, which can interfere with the detection of these beams.

Innovation Solution

The introduction of a deflector between the beam separator and the detector corrects the positional shift between the secondary beams, ensuring they can be accurately detected.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a beam separator is used to deflect secondary beams in a multi beam charged particle beam device, then the secondary beams can be separated from the primary beams, but positional shifts occur between the secondary beams due to differences in incident positions on the beam separator

Engineering Contradiction:
Improvebeam separationVSAvoidpositional accuracy
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

An electrostatic deflector is introduced as an intermediary device between the electromagnetic beam separator and the detector. This deflector generates an electrostatic field that produces deflection chromatic aberration opposite to that of the beam separator, thereby canceling out the positional shifts of secondary beams caused by the beam separator.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention changes the physical parameters of the beam path by introducing an electrostatic field with specific field strength and distribution characteristics. By carefully controlling the electrostatic potential and field configuration, the deflection chromatic aberration is adjusted to precisely compensate for the positional shifts introduced by the beam separator.

Inventive Principle:
Principle #35Parameter changes

2Power

If the affected section length in the electric or magnetic field of the beam separator increases, then the deflection amount of the secondary beam increases, but the positional shift between secondary beams becomes larger

Engineering Contradiction:
Improvedeflection capabilityVSAvoidpositional uniformity
Core Design Contradiction:
PowerVSManufacturing precision

Solution Approach 1:

The electrostatic deflector acts as a counterweight to the beam separator by generating an opposing deflection effect. The electrostatic field creates deflection chromatic aberration that counterbalances the magnetic or electric field effects of the beam separator, ensuring that secondary beams from different incident positions converge at the same detector location.

Inventive Principle:
Principle #8Anti-weight (Counterweight)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution effectively reduces the positional shift between secondary beams, improving detection resolution and preventing interference with beam detection.

Implementation Method 1

a beam separator that deflects the secondary beam in a direction different from the primary beam

Methodology Applied
Scientific EffectElectromagnetic deflection: Lorentz Force

Implementation Method 2

a deflector provided between the beam separator and the detector to correct a positional shift between the secondary beams

Methodology Applied
Scientific EffectElectrostatic deflection: Lorentz Force

Data Source

PatentUS12205790B2Charged particle beam device
Publication Date: 2025.01.21 HITACHI HIGH TECH CORP
  • US12205790B2 patent drawing
  • US12205790B2 patent drawing
  • US12205790B2 patent drawing

AI summary

The invention provides a charged particle beam device capable of reducing a positional shift between secondary beams generated in a beam separator. The charged particle beam device includes a charged particle beam source configured to irradiate a sample with a plurality of primary beams, a plurality of detectors configured to detect secondary beams emitted from the sample in correspondence to the primary beams, and a beam separator configured to deflect the secondary beams in a direction different from that of the primary beams. The charged particle beam device further includes a deflector provided between the beam separator and the detector to correct a positional shift between the secondary beams generated in the beam separator.