Multi-Beam Writing Correction for Blanking-Induced Position Shift
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Solution Overview
Problem
Existing multi-beam writing methods face significant computational load due to the need for individual positional deviation correction on each shot, which is exacerbated by changes in the number of beams, leading to beam blur and irradiation position shifts.
Innovation Solution
A method that calculates positional deviation shifts based on the number of blanking beams, determines threshold exceedance, and applies correction amounts to reduce the computational load by optimizing beam-off control for each shot.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If individual positional deviation correction is performed on each shot in multi-beam writing, then manufacturing precision is improved, but computational load increases
Solution Approach 1:
The writing region is divided into multiple shots, and the correction process is segmented into two stages: (1) collective correction for shots with similar blanking beam counts, and (2) individual correction only for shots exceeding a threshold. This segmentation reduces the overall computational load while maintaining manufacturing precision.
Solution Approach 2:
Instead of performing full individual correction on all shots, the patent applies partial correction by grouping shots with similar blanking beam counts and performing collective correction within groups. Individual correction is applied only when necessary (when threshold is exceeded), reducing computational effort while maintaining adequate precision.
2Adaptability or versatility
If the number of beams is changed during writing, then adaptability is improved, but beam blur and irradiation position shifts occur
Solution Approach 1:
The patent calculates and determines the number of blanking beams in advance for each shot before actual writing. By pre-determining which beams will be blanked, the system can anticipate and compensate for position shifts caused by changing beam counts, thereby maintaining irradiation precision despite adaptability in beam configuration.
Solution Approach 2:
The patent implements a feedback mechanism where the calculated number of blanking beams for each shot is used to determine correction amounts for irradiation positions. This feedback loop allows the system to adjust for position shifts caused by beam count changes, maintaining manufacturing precision while allowing beam count adaptability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces the computational burden associated with positional deviation correction in multi-beam writing, enhancing efficiency and reducing beam blur and irradiation position shifts.
Implementation Method 1
When the number of beams changes, the total current amount also changes, which results in generating a so-called beam blur due to the Coulomb effect, etc.
Data Source
AI summary
A multi-charged-particle-beam-writing-method includes calculating, for each of some shots, the first positional-deviation-shift-amount depending on the number of blanking beams of a shot concerned, shifted from a design position of the multiple-charged-particle-beams, determining, for each of some shots, whether there is a shot with respect to which the first positional-deviation-shift-amount exceeds a threshold, calculating, in the case where a shot exceeding the threshold exists, the number of blanking beams controlled to be beam-off in remaining shots in all shots, calculating the second positional-deviation-shift-amount depending on a calculated number of blanking beams in all shots, shifted from the design position of the multiple-charged-particle-beams, and calculating a correction amount for an irradiation position of each shot, based on a calculated second positional-deviation-shift-amount.