Multifunctional Shutter Disk for Single-Chamber Wafer Processing

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Solution Overview

Problem

In semiconductor manufacturing, the process of transferring wafers between dedicated chambers for degassing, pre-cleaning, and deposition processes is time-consuming and limits the overall throughput rate.

Innovation Solution

A multifunctional chamber equipped with a multifunctional shutter disk capable of performing degas, pre-clean, and deposition processes, eliminating the need for separate chambers and reducing transfer times.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If separate dedicated chambers are used for degassing, pre-cleaning, and deposition processes, then each process can be performed with specialized equipment, but the transfer time between chambers increases and throughput rate decreases

Engineering Contradiction:
Improveprocess qualityVSAvoidthroughput rate
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent combines multiple dedicated chambers (degas chamber, pre-clean chamber, and deposition chamber) into a single integrated chamber. The shutter disk is divided into multiple zones that can be independently controlled to create separate process environments within the same chamber, allowing degassing, pre-cleaning, and deposition to occur sequentially without wafer transfer between chambers.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The shutter disk serves multiple functions by having different zones for different processes. The same physical chamber and shutter disk assembly can perform degassing, pre-cleaning, and deposition operations by controlling which zones are active, eliminating the need for separate specialized chambers while maintaining process quality.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Reliability

If multiple separate chambers are used for different processes, then process specialization is improved, but the complexity of the system increases

Engineering Contradiction:
Improveprocess specializationVSAvoidsystem complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent merges multiple chamber functions into a single chamber with a multi-zoned shutter disk. Instead of having separate physical chambers for degassing, pre-cleaning, and deposition, the system uses a single chamber where the shutter disk creates isolated zones that can be activated sequentially, reducing system complexity while maintaining process specialization.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The shutter disk zones are nested within the single chamber volume. Each functional zone (degas zone, pre-clean zone, deposition zone) is a conceptual or physical subdivision of the same chamber space, allowing multiple process environments to coexist in a nested hierarchy within one chamber.

Inventive Principle:
Principle #7Nested doll (Nesting)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The implementation of multifunctional chambers and shutter disks significantly reduces transfer times and increases the throughput rate by allowing all necessary processes to be performed in a single chamber.

Implementation Method 1

activating a source of thermal energy on the shutter disk; heating the workpiece to a temperature sufficient to remove external moisture

Methodology Applied
Scientific EffectHeating: Heating

Implementation Method 2

The etch module is configured to clean the workpiece through physical or chemical etching methods

Methodology Applied
Scientific EffectPhysical etching: Ablation

Implementation Method 3

The etch module is configured to clean the workpiece through physical or chemical etching methods

Methodology Applied
Scientific EffectChemical etching: Oxidation

Implementation Method 4

depositing a film onto the workpiece through physical vapor deposition

Methodology Applied
Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS12344929B2Multi-functional shutter disk for thin film deposition chamber
Publication Date: 2025.07.01 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12344929B2 patent drawing
  • US12344929B2 patent drawing
  • US12344929B2 patent drawing

AI summary

The present disclosure provides a multifunction chamber having a multifunctional shutter disk. The shutter disk includes a lamp device, a DC/RF power device, and a gas line on one surface of the shutter disk. With this configuration, simplifying the chamber type is possible as the various specific, dedicated chambers such as a degas chamber, a pre-clean chamber, a CVD/PVD chamber are not required. By using the multifunctional shutter disk, the degassing function and the pre-cleaning function are provided within a single chamber. Accordingly, a separate degas chamber and a pre-clean chamber are no longer required and the overall transfer time between chambers is reduced or eliminated.