Multi-gate FET Logic Gates for High-Density Integration

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Solution Overview

Problem

Conventional digital logic circuits face challenges in reducing the area occupied by each logic gate, as increasing the size of stacked devices to reduce ON resistance limits the number of inputs that can be realized in NAND and NOR gates.

Innovation Solution

The use of multi-gate FETs in logic gates, where a first portion is configured to interconnect the output with either the voltage supply or ground upon input activation, and a second portion, comprising a multi-gate FET of a different type, conducts logically only when both gates are activated, allowing for higher-density logic circuits.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the size of stacked devices is increased to reduce ON resistance, then the ON resistance decreases, but the area occupied by each logic gate increases

Engineering Contradiction:
ImproveON resistanceVSAvoidarea occupied by logic gate
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The patent merges multiple gate functions into a single multi-gate FET structure. Instead of using separate stacked devices for each input, the invention integrates multiple gates (first gate and second gate) onto a single FET channel, allowing logical AND functionality while reducing the overall device area and maintaining low ON resistance.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The patent transitions from a planar single-gate structure to a three-dimensional multi-gate structure. The multi-gate FET employs gates positioned on multiple surfaces (e.g., top and bottom gates, or gates on multiple sides of a FinFET channel), effectively utilizing vertical and lateral dimensions to enhance control over the channel while compacting the footprint area.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Reliability

If the size of stacked devices is increased to reduce ON resistance, then the ON resistance decreases, but the number of inputs that can be realized is limited

Engineering Contradiction:
ImproveON resistanceVSAvoidnumber of inputs
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent combines multiple input control functions into a single multi-gate FET device. The first gate and second gate of the multi-gate FET work together to provide logical AND functionality for multiple inputs, eliminating the need for additional stacked devices and thereby supporting more inputs without increasing device stack height or limiting input scalability.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The multi-gate FET structure serves multiple functions simultaneously: it provides logical AND operation for multiple inputs, maintains low ON resistance, and enables high-density integration. This universal structure can be applied to various logic gate configurations (NAND, NOR, etc.) and input counts, making the device highly versatile and scalable.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Reliability

If conventional stacked devices are used, then the logical functionality is maintained, but the area occupied by each logic gate increases

Engineering Contradiction:
Improvelogical functionalityVSAvoidarea occupied by logic gate
Core Design Contradiction:
ReliabilityVSArea of stationary object

Solution Approach 1:

The patent merges the functionality of multiple conventional stacked devices into a single multi-gate FET. The first portion (conventional FET) and second portion (multi-gate FET) work together to achieve the same logical functionality as traditional stacked configurations, but with significantly reduced area due to the compact multi-gate structure.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The invention moves from two-dimensional planar device stacking to three-dimensional multi-gate configurations. By positioning gates on multiple surfaces and utilizing vertical channel structures, the patent achieves enhanced logical control and higher density within a smaller footprint area, effectively breaking the area-scaling limitation of conventional approaches.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS8030971B2High-density logic techniques with reduced-stack multi-gate field effect transistors
Publication Date: 2011.10.04 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US8030971B2 patent drawing
  • US8030971B2 patent drawing
  • US8030971B2 patent drawing

AI summary

Techniques for employing multi-gate field effect transistors (FETS) in logic circuits formed from logic gates are provided. Double-gate transistors that conduct only when both transistor gates are active can be used to reduce the number of devices hitherto required in series or “stacked” portions of logic gates. Circuit area can be reduced and performance can be enhanced.