Multilayer Coating Deposition Tool with Contamination Control
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Solution Overview
Problem
Current methods for applying multilayer coatings to sheet substrates face challenges in achieving high production rates while preventing cross-contamination and accommodating both continuous and discrete substrates, including rigid or flexible devices mounted on them.
Innovation Solution
An in-line tool configuration that allows for the sequential deposition of organic and inorganic layers in a common vacuum environment, with isolation devices to control contamination, and optional features like accumulators and surface treatment chambers to enhance adhesion and processing efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a common vacuum chamber is used for both organic and inorganic deposition stations, then production rate is improved and device complexity is reduced, but contamination between layers occurs
Solution Approach 1:
The common vacuum chamber is segmented into distinct deposition zones using physical barriers (baffles) and localized vacuum isolation techniques. This allows organic and inorganic deposition stations to operate simultaneously in the same chamber while preventing material cross-contamination, thus maintaining high productivity without compromising layer purity.
Solution Approach 2:
An intermediary shielding structure (chamber or baffle) is introduced between the organic and inorganic deposition stations. This intermediary element blocks the migration of organic vapor to the inorganic deposition zone, enabling both processes to occur in a common chamber without contamination while preserving production efficiency.
2Object-affected harmful factors
If separate vacuum chambers are used for organic and inorganic deposition stations, then contamination is reduced, but device complexity and production rate are worsened
Solution Approach 1:
Multiple deposition functions (organic and inorganic) that traditionally required separate vacuum chambers are merged into a single common vacuum chamber. By implementing localized isolation mechanisms within the unified chamber, the system achieves contamination prevention without the complexity of multiple chambers, transport systems, and associated control infrastructure.
Solution Approach 2:
The common vacuum chamber is designed to perform multiple deposition functions simultaneously through the use of isolation devices and baffles. This multi-functional design allows the single chamber to replace multiple specialized chambers, reducing overall system complexity while maintaining contamination control and enabling continuous production.
3Device complexity
If organic layer material is allowed to migrate to adjacent stations, then device complexity is reduced, but layer purity and adhesion are worsened
Solution Approach 1:
Instead of implementing uniform isolation throughout the entire vacuum chamber, localized quality control is achieved through strategically placed baffles and isolation devices at specific deposition zones. This targeted approach prevents organic material migration to adjacent stations while minimizing the complexity of the isolation system, maintaining layer purity without excessive structural complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach maximizes production rates, minimizes contamination, and ensures effective adhesion and barrier properties for environmentally sensitive devices, such as OLEDs, by depositing inorganic layers first, which improves the overall performance of the multilayer coating.
Implementation Method 1
a common vacuum throughout which the organic, curing and inorganic stations are placed
Implementation Method 2
vapor deposition imparts a significant heat load to the receiving substrate
Implementation Method 3
vapor deposition imparts a significant heat load to the receiving substrate
Implementation Method 4
polymer layers are deposited and cured at one or more polymer deposition and curing stations
Data Source
AI summary
A tool for depositing multilayer coatings onto a substrate. The tool includes a housing defining a vacuum chamber connected to a vacuum source, deposition stations each configured to deposit a layer of multilayer coating on the substrate, a curing station, and a contamination reduction device. At least one of the deposition stations is configured to deposit an inorganic layer, while at least one other deposition station is configured to deposit an organic layer. In one tool configuration, the substrate may travel back and forth through the tool as many times as needed to achieve the desired number of layers of multilayer coating. In another, the tool may include numerous housings adjacently spaced such that the substrate may make a single unidirectional pass. The contamination reduction device may be configured as one or more migration control chambers about at least one of the deposition stations, and further includes cooling devices, such as chillers, to reduce the presence of vaporous layer precursors. The tool is particularly well-suited to depositing multilayer coatings onto flexible substrates, as well as to encapsulating environmentally-sensitive devices placed on the flexible substrate.