Multilayer Metal Stack Heater for Silicon Photonics

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Solution Overview

Problem

The existing metal heaters, such as TiW, often have resistances that are too high to be efficiently driven by current CMOS or SiGe circuits, leading to mechanical stress and fabrication constraints, making it difficult to achieve the target resistance of 80 ohms while avoiding high mechanical stresses on silicon waveguides.

Innovation Solution

A multilayer heater element is implemented, comprising a titanium tungsten (TiW) barrier layer and gold layers with specific thicknesses, significantly reducing sheet resistance and conductivity, allowing for efficient heating while minimizing mechanical stress and fabrication complexity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a TiW heater element is used with constrained dimensions, then the heater can be integrated on the waveguide without imposing high mechanical stresses, but the resistance becomes too great to be effectively driven by certain drive circuits

Engineering Contradiction:
Improvemechanical stress on waveguideVSAvoidheater resistance
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent applies composite materials by creating a multilayer heater structure consisting of TiW layers combined with Au layers. This composite structure leverages the low stress properties of TiW and the high conductivity of Au to achieve both mechanical reliability and electrical performance. The specific embodiment uses alternating layers of TiW (for stress management) and Au (for conductivity), creating a material composite that resolves the contradiction between mechanical integrity and electrical resistance.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent employs parameter changes by modifying the heater's physical and material parameters - specifically changing from a single-material TiW heater to a multilayer structure with varying thicknesses of TiW and Au layers. By adjusting the thickness parameters of each layer (e.g., TiW layers at 50-150 nm, Au layers at 10-50 nm), the overall resistance is reduced to the target range (e.g., 80 ohms) while maintaining the low-stress mechanical properties through the TiW framework.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If the heater element dimensions are increased to reduce resistance, then the resistance becomes suitable for drive circuits, but high mechanical stresses are imposed on the waveguide

Engineering Contradiction:
Improveheater resistanceVSAvoidmechanical stress on waveguide
Core Design Contradiction:
Manufacturing precisionVSStress or pressure

Solution Approach 1:

The multilayer composite structure allows achieving low resistance without increasing overall dimensions that would cause stress. The high-conductivity Au layers provide the electrical performance needed for low resistance, while the TiW layers maintain the mechanical compliance and low stress on the waveguide. This composite approach decouples the relationship between dimensions and resistance.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent applies local quality by assigning different functional properties to different layers: TiW layers are optimized for mechanical compliance and stress management, while Au layers are optimized for electrical conductivity. This local specialization allows each material to perform its primary function without compromising the other, resolving the contradiction between resistance and stress.

Inventive Principle:
Principle #3Local quality

3Manufacturing precision

If a dedicated lithography layer (e.g., nickel layer) is used to create a heater element, then the heater resistance can be controlled, but the fabrication complexity and cost increase

Engineering Contradiction:
Improveheater resistanceVSAvoidfabrication process
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies universality by designing a heater structure that uses standard CMOS-compatible metal layers (TiW and Au) that can be deposited using existing fabrication processes. This multilayer approach can be integrated into standard semiconductor manufacturing workflows without requiring dedicated lithography steps or specialized equipment, thereby controlling resistance while minimizing fabrication complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent uses parameter changes by optimizing the thickness parameters of standard metal layers to achieve the desired resistance. By adjusting the thickness of TiW and Au layers within standard fabrication capabilities, the heater resistance is controlled to the target value without requiring additional lithography layers or complex fabrication processes.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The multilayer heater achieves a sheet resistance of approximately 1.15 ohms per square, enabling efficient heating of silicon waveguides with reduced mechanical stress and power wastage, while maintaining a low mean time to failure due to electromigration and effective thermal isolation.

Implementation Method 1

current may be driven through a metal heater element

Methodology Applied
Scientific EffectJoule heating: Joule Heating

Implementation Method 2

The resistance of the heater depends on the resistivity of the material used to form the heater element

Methodology Applied
Scientific EffectElectrical resistance: Electrical Resistance

Implementation Method 3

effective thermal isolation

Methodology Applied
Scientific EffectThermal isolation: Thermal Insulation

Data Source

PatentUS11262603B2Multilayer metal stack heater
Publication Date: 2022.03.01 ROCKLEY PHOTONICS LTD
  • US11262603B2 patent drawing
  • US11262603B2 patent drawing
  • US11262603B2 patent drawing

AI summary

A silicon photonic integrated circuit with a heater. In some embodiments, the silicon photonic integrated circuit includes a first waveguide, on a top surface of the silicon integrated circuit, and a heater element, on the first waveguide. The heater element may include a first metal layer, on the first waveguide, and a second metal layer, on the first metal layer, the second metal layer having a different composition than the first metal layer, the second layer having a thickness of less than 300 nm.