Multi-Patterning Design Validation via Graph Coloring
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Solution Overview
Problem
Current semiconductor manufacturing technologies, such as double-patterning, struggle to handle design intents with complex and high pattern densities, as they are not capable of validating designs that require triple or higher multiple-patterning processes due to difficulties in design intent validation.
Innovation Solution
A computer-implemented method is developed to validate designs by generating a colored graph representative of the design, identifying conflicts in the mask layout that cause the graph to be non-decomposable, and providing guidance for fixing these conflicts using various coloring algorithms, including hybrid evolutionary algorithms, to make the design decomposable.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If double-patterning technology is used to increase pattern density, then integration density is improved, but the capability to handle complex high-density designs is limited due to validation difficulties
Solution Approach 1:
The patent introduces a graph-based intermediary representation to model the design intent and mask layout conflicts. The graph structure serves as a mediator between the complex multiple-patterning process and the validation system, enabling systematic analysis of design conflicts that arise in triple-patterning and higher-order processes.
Solution Approach 2:
The patent changes the validation approach from direct geometric analysis to graph-theoretic parameter analysis. By transforming the design validation problem into graph coloring problems and conflict detection in decomposability parameters, the system can efficiently handle complex high-density designs that were previously unverifiable.
2Manufacturing precision
If triple or higher multiple-patterning technology is used to achieve higher pattern density, then integration density is improved, but design intent validation becomes intractable
Solution Approach 1:
The patent replaces traditional geometric and physical validation methods with graph-theoretic and algorithmic approaches. By substituting direct geometric analysis with graph coloring algorithms and decomposability checks, the system achieves tractable validation for triple-patterning and higher-order processes.
Solution Approach 2:
The patent extracts the essential validation problem from complex geometric designs by representing them as graphs. This extraction isolates the critical conflict detection task from the overall design complexity, enabling focused algorithmic solutions for identifying and resolving mask layout conflicts.
3Adaptability or versatility
If conventional validation methods are used for multiple-patterning, then simple designs can be validated, but complex high-density designs cannot be processed
Solution Approach 1:
The patent creates a universal graph-based validation framework that handles double-patterning, triple-patterning, and higher-order processes through the same methodology. This multi-functional approach allows the system to adapt to different patterning complexities while maintaining consistent validation throughput.
Data Source
AI summary
A computer implemented method for validating a design is presented. The method includes generating, using the computer, a graph non-decomposable to a colored graph representative of the design, when the computer is invoked to validate the design. The method further includes identifying, using the computer, at least one guidance to at least one conflict in a mask layout associated with the design, the conflict causing the graph to be non-decomposable.