Multiple Patterning Method for Semiconductor Routing Tracks

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

In semiconductor fabrication, the decreasing technology nodes lead to close distances between conductive elements, making it challenging to maintain the physical and color spacing rules due to manufacturing variations, resulting in the need for multiple patterning techniques that are time-consuming and complex.

Innovation Solution

A method and system that impose specific rules on the coloring process to ensure the layout can be segmented into a coloring scheme efficiently, by assigning distinct color groups to routing tracks and adjusting the placement of conductive elements to satisfy both physical and color spacing rules, thereby reducing the complexity and time required for layout design.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If multiple patterning techniques are used to pattern features closer than patterning resolution permits, then manufacturing precision is improved, but device complexity and processing time increase

Engineering Contradiction:
Improvepatterning precisionVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies segmentation by dividing the layout into routing tracks and assigning color groups to different tracks. This systematic segmentation allows the coloring process to be broken down into manageable steps, reducing overall process complexity while maintaining the precision needed for multiple patterning.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent implements preliminary action by assigning color groups to routing tracks before the actual coloring process. This pre-assignment creates a structured framework that guides subsequent coloring operations, reducing the time and complexity of the overall process while ensuring manufacturing precision is maintained.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If multiple patterning techniques are used to pattern features closer than patterning resolution permits, then manufacturing precision is improved, but processing time increases

Engineering Contradiction:
Improvepatterning precisionVSAvoidprocessing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

By segmenting the layout into routing tracks and assigning color groups systematically, the patent reduces the computational complexity of the coloring process. This segmentation allows for more efficient processing compared to traditional approaches, reducing processing time while maintaining the precision required for multiple patterning.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent changes parameters by introducing color group assignments to routing tracks as a new organizational parameter. This parameter change transforms the coloring process from a complex constraint satisfaction problem into a more systematic procedure, thereby reducing processing time while maintaining patterning precision.

Inventive Principle:
Principle #35Parameter changes

3Area of stationary object

If features are positioned closer than patterning resolution permits, then device size is reduced, but maintaining spacing rules becomes more difficult

Engineering Contradiction:
Improvedevice sizeVSAvoidcoloring process complexity
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The patent segments the device layout into routing tracks and assigns color groups to these tracks. This segmentation provides a systematic approach to managing spacing rules in dense layouts, reducing the complexity of the coloring process while enabling smaller device sizes through closer feature positioning.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

By performing preliminary color group assignment to routing tracks, the patent establishes a structured framework that simplifies subsequent coloring operations in dense layouts. This preliminary action reduces the complexity of maintaining spacing rules when features are positioned closer together.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS10990741B2Multiple patterning method and system for implementing the method
Publication Date: 2021.04.27 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US10990741B2 patent drawing
  • US10990741B2 patent drawing
  • US10990741B2 patent drawing

AI summary

A method includes assigning a first color group to a first routing track of the layout. The method further includes assigning a second color group to a second routing track of the layout. The method includes assigning the first color group to a third routing track of the layout, wherein the second routing track is between the first routing track and the third routing track. The method further includes assigning a first color from the first color group to a first conductive element along the first routing track. The method further includes assigning a second color from the first color group to a second conductive element along the first routing track. The method further includes assigning a third color from the second color group to a third conductive element on the second routing track, wherein the third color is different from each of the first color and the second color.