Multiple Seal Ring Structure for Semiconductor Moisture Protection

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Solution Overview

Problem

Semiconductor integrated circuits face issues with moisture ingress and ionic contamination, leading to degradation, threshold voltage instability, and die saw peeling during dicing processes, particularly in backside illuminated devices with low-k inter-metal dielectric films.

Innovation Solution

A multiple seal ring structure is formed around the integrated circuit die, comprising concentric seal ring structures with stacked conductive layers and via layers through dielectric layers, and a passivation layer to prevent die saw peeling and protect the internal circuit from moisture and ionic contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a single seal ring structure is used to protect the IC, then moisture and ionic contamination are blocked, but die saw peeling occurs during dicing processes

Engineering Contradiction:
Improveprotection from moisture and ionic contaminationVSAvoidmechanical strength against die saw cutting forces
Core Design Contradiction:
ReliabilityVSStrength

Solution Approach 1:

The single seal ring is divided into multiple concentric seal rings (first seal ring, second seal ring, etc.) with different structural characteristics. The outer seal ring provides mechanical strength to resist die saw cutting forces, while the inner seal ring focuses on blocking moisture and ionic contamination. This segmentation allows each seal ring to be optimized for its specific function, resolving the contradiction between protection and mechanical strength.

Inventive Principle:
Principle #1Segmentation

2Reliability

If low-k inter-metal dielectric films are used in backside illuminated devices, then device performance is improved, but die saw peeling susceptibility increases

Engineering Contradiction:
Improvedevice performanceVSAvoidresistance to die saw peeling
Core Design Contradiction:
ReliabilityVSStrength

Solution Approach 1:

Multiple concentric seal rings are implemented with the inner seal ring positioned to provide enhanced mechanical support specifically for devices with low-k inter-metal dielectric films. This segmentation allows the low-k materials to maintain their performance benefits while the additional seal ring structure compensates for the reduced mechanical strength, preventing die saw peeling during dicing processes.

Inventive Principle:
Principle #1Segmentation

3Strength

If a thicker single seal ring is used to prevent die saw peeling, then mechanical strength is improved, but moisture and ionic contamination blocking capability may be compromised

Engineering Contradiction:
Improvemechanical strength against die saw forcesVSAvoidblocking capability against moisture and ionic contamination
Core Design Contradiction:
StrengthVSReliability

Solution Approach 1:

The seal ring function is segmented into multiple concentric rings with different thicknesses and material compositions. The outer seal ring is designed with greater thickness to provide mechanical strength against die saw forces, while the inner seal ring is optimized with appropriate thickness and material properties to effectively block moisture and ionic contamination. This segmentation resolves the contradiction by distributing the functional requirements across multiple specialized structures.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the seal ring structure are given different local qualities - the outer seal ring has greater thickness for mechanical strength, while the inner seal ring has optimized thickness and material composition for contamination blocking. This local quality differentiation allows each region to excel at its specific function without compromising the other.

Inventive Principle:
Principle #3Local quality

Data Source

PatentUS8461021B2Multiple seal ring structure
Publication Date: 2013.06.11 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US8461021B2 patent drawing
  • US8461021B2 patent drawing
  • US8461021B2 patent drawing

AI summary

The present disclosure provides a method of fabricating a semiconductor device, the method including providing a substrate having a seal ring region and a circuit region, forming a first seal ring structure over the seal ring region, forming a second seal ring structure over the seal ring region and adjacent to the first seal ring structure, and forming a first passivation layer disposed over the first and second seal ring structures. A semiconductor device fabricated by such a method is also provided.