Multistage Substrate Cooling Nozzle Layout for Uniform Gas Cooling
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate cooling processes in semiconductor manufacturing are inefficient, particularly in load lock chambers where substrates are in standby, leading to suboptimal cooling efficiency.
Innovation Solution
A substrate processing apparatus with a vessel containing multistage-supported substrates and cooling nozzles with alternating gas supply holes for efficient cooling gas distribution, allowing simultaneous cooling of both surfaces of substrates in a multistage arrangement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single cooling nozzle is used to cool multiple substrates, then the device complexity is reduced, but the cooling efficiency and uniformity deteriorate
Solution Approach 1:
The cooling system is segmented into multiple independent cooling nozzles (first cooling nozzle and second cooling nozzle), each responsible for cooling specific substrates. This segmentation allows each nozzle to be optimized for its specific cooling task, improving overall cooling efficiency and uniformity while maintaining manageable system complexity.
Solution Approach 2:
Each cooling nozzle is equipped with gas supply holes positioned at specific locations to cool specific substrates locally. The first cooling nozzle cools the first substrate with gas supply holes positioned to cool its surfaces, while the second cooling nozzle cools the second substrate with its own gas supply holes. This local quality approach ensures uniform and efficient cooling across all substrates.
2Device complexity
If cooling gas is supplied to multiple substrates through a single nozzle, then the device complexity is reduced, but the cooling uniformity and precision deteriorate
Solution Approach 1:
The cooling gas supply system is segmented into multiple nozzles, each with its own gas supply holes positioned to cool specific substrates. This segmentation enables precise control of cooling gas distribution, ensuring uniform cooling across all substrates while maintaining a relatively simple overall system structure.
Solution Approach 2:
Multiple cooling nozzles act as intermediaries between the cooling gas source and the substrates. Each nozzle is positioned and configured to deliver cooling gas to specific substrates, ensuring uniform and precise cooling. This intermediary approach improves cooling uniformity while keeping the system structure manageable.
3Productivity
If substrates are cooled in a multistage arrangement, then the cooling efficiency is improved, but the device complexity increases
Solution Approach 1:
The substrates are arranged in a multistage configuration along the vertical dimension, with multiple substrates positioned at different heights within the vessel. This vertical arrangement allows multiple cooling nozzles to cool multiple substrates simultaneously, significantly improving cooling efficiency. The support structure is designed to hold substrates in this vertical arrangement, managing the added complexity through efficient spatial utilization.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances cooling efficiency by uniformly cooling substrates in a shorter time with reduced gas consumption, minimizing thermal impact on subsequent handling processes.
Implementation Method 1
a first cooling nozzle and a second cooling nozzle among the plurality of cooling nozzles are configured such that the cooling gas is supplied for a first substrate among the plurality of substrates through the gas supply hole of the first cooling nozzle, and the cooling gas is supplied for a second substrate other than the first substrate among the plurality of substrates through the gas supply hole of the second cooling nozzle
Data Source
AI summary
To improve the cooling efficiency of a substrate, a cooling system includes: a vessel with a support capable of supporting a plurality of substrates in a multistage manner; and a plurality of cooling nozzles arranged along an inner surface of the vessel, wherein each of the plurality of cooling nozzles includes a gas supply hole through which a cooling gas is supplied for the plurality of substrates supported by the support, wherein a first cooling nozzle and a second cooling nozzle among the plurality of cooling nozzles are configured such that the cooling gas is supplied for a first substrate among the plurality of substrates through the gas supply hole of the first cooling nozzle, and the cooling gas is supplied for a second substrate other than the first substrate among the plurality of substrates through the gas supply hole of the second cooling nozzle.


