Multi-Tone Mask Photolithography for LCD Black Matrix and Spacer
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Solution Overview
Problem
The manufacturing process of black matrix and spacer in LCDs is complicated and costly due to the need for independent photolithography processes, which increases production complexity and costs.
Innovation Solution
A method using a multi-tone mask plate to simultaneously expose and develop black and transparent photoresist layers, forming both spacer and black matrix structures in a single photolithography process, thereby simplifying the manufacturing process and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If independent photolithography processes are used for manufacturing spacer and black matrix, then manufacturing precision can be maintained, but device complexity and manufacturing cost increase
Solution Approach 1:
The patent combines the manufacturing processes of spacer and black matrix into a single photolithography step by using a multi-layer photoresist structure (first photoresist layer for spacer, second photoresist layer for black matrix) that is exposed and developed simultaneously, thereby reducing process complexity while maintaining alignment precision through the stacked photoresist layers
Solution Approach 2:
The multi-layer photoresist structure serves multiple functions: the first photoresist layer defines the spacer pattern while the second photoresist layer defines the black matrix pattern, allowing both components to be manufactured in one process cycle, thus achieving multi-functionality in a single photolithography step
2Manufacturing precision
If independent photolithography processes are used for manufacturing spacer and black matrix, then manufacturing precision can be maintained, but manufacturing cost increases
Solution Approach 1:
The patent merges two separate photolithography processes into one by using a dual-layer photoresist system where both spacer and black matrix patterns are formed simultaneously through single exposure and development, reducing manufacturing cost while maintaining alignment precision through the layered photoresist structure
3Device complexity
If single photolithography process is used to manufacture spacer and black matrix simultaneously, then device complexity and manufacturing cost are reduced, but alignment precision may deteriorate
Solution Approach 1:
The patent segments the photoresist system into two distinct layers (first photoresist layer for spacer, second photoresist layer for black matrix), allowing each layer to be independently patterned through the multi-tone mask while maintaining precise alignment through the stacked configuration and selective exposure
Solution Approach 2:
The patent applies local quality by using a multi-tone mask with different transmittance regions: the first light-transmitting area (higher transmittance) exposes the first photoresist layer for spacer formation, while the second light-transmitting area (lower transmittance) exposes the second photoresist layer for black matrix formation, ensuring precise local pattern definition for each component
4Ease of manufacture
If single photolithography process is used to manufacture spacer and black matrix simultaneously, then manufacturing cost is reduced, but alignment errors may occur
Solution Approach 1:
The patent segments the exposure process into distinct light-transmitting areas with different transmittance values in the multi-tone mask, allowing the first photoresist layer and second photoresist layer to be exposed under different optical conditions, thereby preventing alignment errors while maintaining cost efficiency through single-process manufacturing
Solution Approach 2:
The patent changes the optical parameter (light transmittance) of different mask regions to control the exposure of different photoresist layers: the first light-transmitting area has higher transmittance for spacer exposure, while the second light-transmitting area has lower transmittance for black matrix exposure, ensuring accurate pattern formation without alignment errors
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the LCD manufacturing process, reduces production costs, and eliminates alignment errors, leading to improved yield and efficiency.
Implementation Method 1
exposing the transparent photoresist layer and the black photoresist layer by the multi-tone mask plate, in which the transparent photoresist layer in the first section is used to form a main spacer, the black photoresist layer in the first section is used to form a first black matrix
Data Source
AI summary
Disclosed is a method for manufacturing black matrix and spacer, which includes steps of: providing a base substrate and coating the base substrate with a black photoresist layer; coating a transparent photoresist layer on black photoresist layer; providing a multi-tone mask plate including a first light-transmitting area and a second light-transmitting area, in which the transparent photoresist layer and the black photoresist layer both include a first section aligning with first light-transmitting area and a second section aligning with second light-transmitting area; using the multi-tone mask plate to expose transparent photoresist layer and black photoresist layer, in which the transparent photoresist layer in the first section forms a main spacer, and the black photoresist layer in the first section forms a first black matrix, the transparent photoresist layer in the second section forms an auxiliary spacer, and the black photoresist layer in the second section forms a second black matrix.