Molecular Vapor Deposition Multilayer Coatings

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Solution Overview

Problem

Current methods for depositing multilayered coatings on a nanometer scale lack precise control over thickness, mechanical properties, and surface properties, leading to non-uniformity and functional discontinuities due to inadequate control of molecular-level reactions during vapor-phase deposition.

Innovation Solution

The use of Molecular Vapor Deposition (MVD) techniques with carefully controlled amounts of precursor reagents and a non-reactive carrier gas to achieve precise control over the deposition process, including plasma treatment and precise addition of reactants, to form uniform, functional multilayered coatings with controlled thickness, chemical, and structural composition.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If common vapor-phase deposition methods are used, then coating deposition is achieved, but sufficient control of molecular level reactions during deposition is not permitted

Engineering Contradiction:

Improvecontrol of molecular level reactionsVSAvoiddeposition process control

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The deposition process is segmented into distinct sequential steps: first depositing an oxide-based layer with specific molecular composition, then depositing an organic-based layer with controlled thickness and properties. This segmentation allows independent optimization and control of molecular-level reactions for each layer type, achieving precise manufacturing precision without excessive overall process complexity.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The oxide-based layer is deposited in advance as a foundation layer before the organic-based layer. This preliminary action prepares the surface with specific chemical properties that enable controlled molecular-level reactions during subsequent organic layer deposition, ensuring precise control over the final coating structure and functionality.

Inventive Principle:

Principle #10Preliminary action

2Manufacturing precision

If multilayered coatings are deposited with controlled thickness and composition, then uniformity is improved, but process control complexity increases

Engineering Contradiction:

Improveuniformity of coatingVSAvoidprocess control

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention controls deposition parameters including vapor pressure, temperature, and reactant ratios to achieve uniform multilayered coatings. By systematically adjusting these parameters during oxide and organic layer deposition, uniform thickness and composition are achieved while maintaining manageable process control through established deposition methodologies.

Inventive Principle:

Principle #35Parameter changes

3Strength

If oxide-based layer is used as bonding layer, then chemical bonding to substrate is achieved, but control over surface properties of overlying layer is reduced

Engineering Contradiction:

Improvechemical bondingVSAvoidsurface properties control

Core Design Contradiction:

StrengthVSManufacturing precision

Solution Approach 1:

The invention applies different material compositions to different layers: the oxide-based layer provides strong chemical bonding to the substrate, while the overlying organic-based layer is specifically engineered with controlled thickness, composition, and molecular structure to provide desired surface properties. This local differentiation of material quality enables simultaneous achievement of strong bonding and precise surface property control.

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Results in multilayered coatings with uniform thickness, mechanical properties, and surface properties, enhancing functionality and reliability on a nanometer scale, with improved control over film growth and surface coverage.

Implementation Method 1

contacting a substrate surface with a liquid phase... chemical vapor deposition, where activated (e.g. by means of plasma, radiation, or temperature, or a combination thereof) species react either in a vapor phase (with subsequent deposition of the reacted product on the substrate) or react on the substrate surface to produce a reacted product on the substrate

Methodology Applied

Scientific EffectHydrolysis: Hydrolysis

Implementation Method 2

evaporative deposition, where evaporated material condenses on a substrate to form a layer

Methodology Applied

Scientific EffectCondensation: Condensation

Implementation Method 3

chemical vapor deposition, where activated (e.g. by means of plasma, radiation, or temperature, or a combination thereof) species react

Methodology Applied

Scientific EffectPlasma: Plasma

Data Source

PatentUS7776396B2Controlled vapor deposition of multilayered coatings adhered by an oxide layer

Publication Date: 2010.08.17 SPTS TECH LTD

AI summary

An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and an organic-based layer is directly deposited over the oxide-based layer. Typically, a series of alternating layers of oxide-based layer and organic-based layer are applied.