MWIR Emitter Using Tungsten Array and Hermetic Barrier
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Solution Overview
Problem
The existing methods for manufacturing medium wavelength infrared (MWIR) narrow band emitters are inefficient due to low emissivity materials like gold and challenging manufacturing tolerances, which result in low power efficiency and poor control over device parameters.
Innovation Solution
The use of a chemically polished tungsten array combined with a passive hermetic barrier and mirror, along with a metal photonic band gap filter, to create a high-performance MWIR emitter, employing tungsten as a high emissivity material to achieve greater energy densities at the photonic band gap structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If gold is used as the emitter material, then the device has good electrical conductivity, but the emissivity is very low resulting in low power efficiency
Solution Approach 1:
The patent changes the material parameter from gold to tungsten, which fundamentally alters the emissivity characteristic. Tungsten provides high emissivity in the infrared range, directly resolving the low power efficiency problem while maintaining structural integrity for device reliability
Solution Approach 2:
The patent employs a composite structure combining tungsten emitter elements with silicon substrate and silicon nitride barrier layers. This composite approach leverages the high emissivity of tungsten while utilizing the structural and protective properties of silicon and silicon nitride to maintain overall device reliability
2Manufacturing precision
If holes are etched in substrate and heating is applied from behind, then the structure acts as a filter, but the manufacturing tolerances are difficult to achieve
Solution Approach 1:
Instead of etching holes in the substrate and heating from behind, the patent inverts the approach by depositing tungsten emitter patterns directly onto the silicon substrate surface. This inversion simplifies the manufacturing process, making tolerances easier to control while achieving the same infrared filtering function through the photonic bandgap structure
Solution Approach 2:
The patent replaces the mechanical etching process with a deposition-based approach. By using physical vapor deposition or chemical vapor deposition to form tungsten emitter patterns, the process becomes more controllable and less sensitive to manufacturing tolerances compared to traditional wet or dry etching methods
3Loss of energy
If tungsten is used as emitter material, then the emissivity is high improving power efficiency, but the device parameters require better control
Solution Approach 1:
The patent applies preliminary planarization to the silicon substrate surface before depositing the tungsten emitter material. This preliminary action ensures a flat, uniform surface that facilitates precise control of emitter thickness and pattern dimensions, directly addressing the device parameters control requirement while maintaining the high emissivity benefit of tungsten
Solution Approach 2:
The patent introduces silicon nitride as an intermediary barrier layer between the silicon substrate and tungsten emitter. This intermediary layer provides a controlled interface that facilitates precise deposition control of the tungsten emitter thickness and pattern, enabling better device parameters control while preserving the high power efficiency of tungsten
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the efficiency of MWIR emitters by allowing better control over device parameters and increasing energy densities, leading to improved infrared emission performance.
Implementation Method 1
By using a high emissivity material like tungsten we are able to develop greater energy densities at the photonic band gap structure
Implementation Method 2
the heater of the present invention is a metal photonic band gap (PBG) filter
Data Source
AI summary
A device for medium wavelength infrared emission and a method for the manufacture thereof is provided. The device has a semiconductor substrate; a passive hermetic barrier disposed upon the substrate, and an emitter element disposed within said hermetic barrier; and a mirror.


