Mach-Zehnder Modulator Reverse Mesa Waveguide

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Solution Overview

Problem

Current optical modulators face challenges in achieving high-speed, low-cost, and efficient optical transmission due to physical and economic limitations, particularly in reducing contact resistance and improving production yield rates in the manufacturing process.

Innovation Solution

A Mach-Zehnder interferometric optical modulator with a shallow ridge waveguide structure and a method for manufacturing, featuring a reverse mesa-type phase shift region and improved etching processes, which reduces contact resistance between electrodes and waveguides and enhances production yield by optimizing the etching process margin.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional waveguide structures are used, then manufacturing process is simpler, but contact resistance between electrode and branch waveguide is high

Engineering Contradiction:
Improvecontact resistanceVSAvoidwaveguide structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent applies inversion by using a reverse mesa structure where the waveguide width is wider at the top surface than at the bottom. This inverted geometry allows the electrode to contact a broader area of the waveguide at the top surface, significantly reducing contact resistance while maintaining structural integrity through the tapered profile.

Inventive Principle:
Principle #13The other way round (Inversion)

Solution Approach 2:

The reverse mesa structure creates local quality variation by having different widths at different heights of the waveguide. The top portion has a wider width for low contact resistance, while the bottom portion maintains a narrower width for proper optical confinement, optimizing both electrical and optical performance in different regions.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If complex etching processes are used to achieve precise waveguide structures, then manufacturing precision is improved, but production yield rate decreases

Engineering Contradiction:
Improveetching precisionVSAvoidproduction yield rate
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent changes the etching parameters by using a single etching process with optimized conditions to create the reverse mesa structure, rather than multiple sequential etching steps. This parameter optimization achieves the desired waveguide profile with improved process margin, reducing defects and increasing production yield while maintaining manufacturing precision.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively reduces optical loss and contact resistance, increases production yield, and enhances the efficiency of optical transmission by using a reverse mesa-type phase shift region and improved etching processes in the Mach-Zehnder interferometric optical modulator.

Implementation Method 1

reduces contact resistance between electrodes and waveguides

Methodology Applied
Scientific EffectContact resistance reduction: Electrical Resistance

Implementation Method 2

Mach-Zehnder interferometric optical modulator

Methodology Applied
Scientific EffectOptical interference: Interference

Implementation Method 3

phase shift region provided between the first and second connection regions

Methodology Applied
Scientific EffectPhase shift: Phase Modulation

Data Source

PatentUS12072600B2Mach-zehnder interferometric optical modulator with shallow ridge waveguide structure and method for manufacturing the same
Publication Date: 2024.08.27 ELECTRONICS & TELECOMM RES INST
  • US12072600B2 patent drawing
  • US12072600B2 patent drawing
  • US12072600B2 patent drawing

AI summary

Disclosed are a Mach-Zehnder interferometric optical modulator and a method for manufacturing the same. The modulator includes first and second lower clad layers, a core layer, an upper clad layer, a waveguide, and electrodes. The waveguide may include an input waveguide, a waveguide divider, branch waveguides, and a waveguide combiner. Each of the branch waveguides includes first and second connection regions connected to the waveguide combiner and the waveguide divider, respectively, and a phase shift region having a cross-section of a reverse mesa structure that has an upper width that is the same as widths of the first and second connection regions and a lower width that is smaller than the widths of the first and second connection regions.