N-type Organic Semiconductor Mobility and Stability

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Solution Overview

Problem

Current organic semiconductor materials for n-type thin film transistors have limited mobility and stability, with existing n-type semiconductors being susceptible to degradation in air and requiring expensive deposition techniques, and there is a need for n-type semiconductor layer compositions that are easily processed and provide control over film morphology and stability.

Innovation Solution

The use of N,N′-dicycloalkyl-substituted naphthalene diimide compounds combined with specific polymeric additives, which exhibit high field effect electron mobility and stability, allowing for the formation of n-channel organic semiconducting layers with improved operational stability and morphology, enabling the fabrication of n-type semiconductor devices without the need for prior treatment of contact means.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If amorphous silicon is used as semiconductor material, then manufacturing cost is reduced, but device mobility is limited to 0.5-1.0 cm2/Vsec

Engineering Contradiction:
Improvemanufacturing costVSAvoiddevice mobility
Core Design Contradiction:
Ease of manufactureVSSpeed

Solution Approach 1:

The patent changes the material parameter from amorphous silicon to organic semiconductor compounds (specifically N,N′-dicycloalkyl-substituted naphthalene diimides), which enables solution processing and low-temperature fabrication while achieving electron mobilities exceeding 0.01 cm2/Vsec, thus resolving the contradiction between manufacturing cost and device mobility

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs composite material systems combining organic semiconductor compounds with specific polymer additives (having permittivity 1.5-5.0) to achieve both ease of processing and high mobility, creating a material composite that simultaneously addresses manufacturing cost and performance requirements

Inventive Principle:
Principle #40Composite materials

2Reliability

If high processing temperatures (360°C) are used for amorphous silicon deposition, then electrical characteristics are improved, but substrate material selection is limited

Engineering Contradiction:
Improveelectrical characteristicsVSAvoidsubstrate material selection
Core Design Contradiction:
ReliabilityVSAdaptability or versatility

Solution Approach 1:

The patent changes the processing temperature parameter from high (360°C) to low (room temperature or mild heating), enabling the use of temperature-sensitive substrates such as plastics while maintaining acceptable electrical characteristics through the use of organic semiconductor materials

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent utilizes solution processing in organic solvents, creating a chemically inert processing environment that allows deposition on diverse substrates including plastics, thereby expanding substrate material selection while achieving functional semiconductor layers

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

3Ease of manufacture

If conventional n-type organic semiconductor materials are used, then device fabrication is simplified, but mobility and stability are insufficient

Engineering Contradiction:
Improvefabrication simplicityVSAvoidmobility and stability
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent creates a composite semiconductor system by combining N,N′-dicycloalkyl-substituted naphthalene diimide compounds with specific polymer additives (permittivity 1.5-5.0), achieving electron mobilities >0.01 cm2/Vsec and improved operational stability while maintaining solution processability

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent optimizes the polymer additive permittivity parameter to the range of 1.5-5.0, which enhances the mobility and stability of the organic semiconductor layer while preserving the simplicity of solution-based fabrication processes

Inventive Principle:
Principle #35Parameter changes

4Ease of operation

If existing n-type organic semiconductors are used, then processing is easier, but film morphology control and air stability are poor

Engineering Contradiction:
Improveprocessing easeVSAvoidfilm morphology control and air stability
Core Design Contradiction:
Ease of operationVSStability of the object's composition

Solution Approach 1:

The patent develops a composite material system where N,N′-dicycloalkyl-substituted naphthalene diimides are combined with specific polymer additives, achieving both ease of solution processing and improved film morphology with enhanced air stability

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The polymer additive acts as an intermediary material that mediates between the semiconductor compound and the environment, improving film morphology control and providing protection against degradation in air while maintaining processing simplicity

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS8309394B2Method of making N-type semiconductor devices
Publication Date: 2012.11.13 EASTMAN KODAK CO
  • US8309394B2 patent drawing
  • US8309394B2 patent drawing
  • US8309394B2 patent drawing

AI summary

An organic semiconducting composition consists essentially of an N,N-dicycloalkyl-substituted naphthalene diimide and a polymer additive comprising an insulating or semiconducting polymer having a permittivity at 1000 Hz of at least 1.5 and up to and including 5. This composition can be used to provide a semiconducting layer in a thin-film transistor that can be incorporated into a variety of electronic devices.