NAND Flash Channel Isolation Switching for Program Disturb Reduction
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Solution Overview
Problem
Program disturb occurs in non-volatile storage elements during the programming of NAND flash memory, where the threshold voltage of unselected storage elements is shifted due to programming of other elements, affecting both programmed and erased states, leading to operational limitations.
Innovation Solution
Implementing a non-volatile storage system with a source side boosting scheme, where the NAND string is boosted on the source side before the drain side, and specific voltage configurations are applied to word lines to isolate and control channel regions, reducing program disturb by managing electric fields and charge injection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If program voltage is applied to control gate during programming operation, then storage elements can be programmed, but program disturb occurs causing threshold voltage shift in unselected storage elements
Solution Approach 1:
The patent segments the channel into multiple regions by applying different voltages to different word lines. The selected word line region receives high voltage for programming, while unselected word line regions receive low voltage to isolate and prevent program disturb, effectively dividing the channel into programmed and unprogrammed segments.
Solution Approach 2:
The patent applies local quality by providing different voltage conditions to different spatial locations within the channel. The selected channel region receives high voltage for electron injection, while unselected regions maintain low voltage to prevent hot carrier generation, creating localized programming action without affecting other regions.
2Productivity
If high voltage is applied to boost channel for programming, then programming efficiency improves, but hot carrier injection occurs causing program disturb
Solution Approach 1:
The patent segments the channel into multiple regions by applying different voltages to different word lines. The selected word line region receives high voltage for programming, while unselected word line regions receive low voltage to isolate and prevent program disturb, effectively dividing the channel into programmed and unprogrammed segments.
Solution Approach 2:
The patent applies local quality by providing different voltage conditions to different spatial locations within the channel. The selected channel region receives high voltage for electron injection, while unselected regions maintain low voltage to prevent hot carrier generation, creating localized programming action without affecting other regions.
3Productivity
If multiple storage elements are programmed in parallel, then programming speed increases, but program disturb affects both programmed and erased states
Solution Approach 1:
The patent segments the channel into multiple regions by applying different voltages to different word lines. The selected word line region receives high voltage for programming, while unselected word line regions receive low voltage to isolate and prevent program disturb, effectively dividing the channel into programmed and unprogrammed segments.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces program disturb by maintaining the integrity of threshold voltages, enhancing the operating window for non-volatile storage devices and preventing hot carrier injection, thus improving data retention and programming accuracy.
Implementation Method 1
specific voltage configurations are applied to word lines to isolate and control channel regions, reducing program disturb by managing electric fields and charge injection
Implementation Method 2
managing electric fields and charge injection... preventing hot carrier injection
Data Source
AI summary
Non-volatile storage in which program disturb is reduced by preventing source side boosting in selected NAND strings. A self-boosting mode which includes an isolation word line is used. A channel area of an inhibited NAND string is boosted on a source side of the isolation word line before the channel is boosted on a drain side of the isolation word line. Further, storage elements near the isolation word line are kept in a conducting state during the source side boosting so that the source side channel is connected to the drain side channel. In this way, in selected NAND strings, source side boosting can not occur and thus program disturb due to source side boosting can be prevented. After the source side boosting, the source side channel is isolated from the drain side channel, and drain side boosting is performed.


