NAND Flash Select Gate Voltage Adjustment Circuit

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Solution Overview

Problem

In NAND flash memory, the select gate voltage during erase operations can become too high due to capacitive coupling, leading to electron tunneling and trapping issues that affect endurance and reliability, as it is challenging to adjust the final voltage of the select gate effectively.

Innovation Solution

A circuit with a capacitive coupling between a well and a select gate, including an adjustment unit that generates a driving voltage based on a non-constant voltage, and a switch to control the voltage applied to the select gate, allowing for the reduction of the coupling voltage and optimization of the select gate's voltage during erase operations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the select gate is coupled to high voltage due to capacitive coupling with p-well during erase operation, then the vertical electric field is reduced, but a large horizontal electric field exists between floating gate and select gate causing electron tunneling and depleting channel

Engineering Contradiction:
ImproveenduranceVSAvoidelectron tunneling
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The patent introduces a dummy word line as an intermediary element positioned between the select gate and the floating gate. This dummy word line acts as a mediator to block the direct capacitive coupling path that causes harmful electron tunneling, while still allowing the select gate to be properly coupled to high voltage through the p-well for erase operations. The intermediary structure selectively filters the electric field interactions.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The patent extracts the problematic direct capacitive coupling path between the select gate and floating gate by introducing the dummy word line as a separating layer. This effectively removes the harmful electron tunneling pathway while preserving the necessary vertical coupling between select gate and p-well through a different route.

Inventive Principle:
Principle #2Taking out (Extraction)

2Reliability

If the select gate is coupled to low voltage, then electron tunneling is reduced, but the vertical electric field between select gate and p-well increases causing oxide stress and electron trapping

Engineering Contradiction:
ImproveenduranceVSAvoidoxide stress
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The dummy word line serves as an intermediary that enables the select gate to maintain low voltage (reducing horizontal electron tunneling) while still allowing proper vertical coupling to the p-well through the dummy word line structure. This mediator prevents direct stress on the oxide between select gate and p-well.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Reliability

If the select gate voltage is adjusted to optimize endurance, then electron tunneling is reduced, but it becomes challenging to effectively control the final voltage of the select gate

Engineering Contradiction:
ImproveenduranceVSAvoidvoltage control complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The dummy word line structure enables the select gate voltage to self-adjust to optimal levels during erase operations. The capacitive coupling through the dummy word line automatically establishes the appropriate voltage distribution without requiring complex external control circuits, allowing the system to self-optimize for endurance.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution improves the endurance of NAND flash memory by preventing excessive voltage coupling, reducing electron tunneling and trapping, and enhancing the reliability of the memory by allowing for optimal voltage adjustment during erase operations.

Implementation Method 1

There is a capacitive coupling between the well and the select gate

Methodology Applied
Scientific EffectCapacitive coupling: Capacitance

Implementation Method 2

Flash memories use Fowler-Nordheim (FN) tunneling from floating gates to p-well to erase flash cells

Methodology Applied
Scientific EffectElectron tunneling: Electron Beam

Implementation Method 3

Flash memories use Fowler-Nordheim (FN) tunneling from floating gates to p-well to erase flash cells

Methodology Applied
Scientific EffectFowler-Nordheim tunneling: Electron Beam

Data Source

PatentUS10325662B2Circuit and method for adjusting select gate voltage of non-volatile memory during erasure of memory cells based on a well voltage
Publication Date: 2019.06.18 MACRONIX INTERNATIONAL CO LTD
  • US10325662B2 patent drawing
  • US10325662B2 patent drawing
  • US10325662B2 patent drawing

AI summary

A circuit for adjusting a select gate voltage of a non-volatile memory is provided. The circuit includes a well, a select gate, and an adjustment unit. There is a capacitive coupling between the well and the select gate. The adjustment unit generates a driving voltage for the select gate based on a non-constant voltage.