Nano Pattern Formation Using Beam Expansion and Blocking
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Solution Overview
Problem
Current nano-patterning techniques face challenges in achieving uniformity over wide areas while being cost-effective and efficient, with methods like beam expansion and beam scanning suffering from reduced pattern uniformity and high equipment costs.
Innovation Solution
An apparatus combining beam expansion and beam scanning methods, utilizing a beam splitter, variable mirrors, beam expansion units, and a beam blocking unit to uniformly irradiate a substrate with expanded beams, focusing on the central region of highest intensity and transferring the substrate to form patterns across the entire surface.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If beam expansion method is used to widen the area on which pattern is produced, then the area coverage is improved, but the pattern uniformity deteriorates due to Gaussian beam intensity distribution
Solution Approach 1:
The patent extracts only the central high-intensity region of the expanded laser beam by blocking the peripheral low-intensity regions. This is achieved by positioning the beam expansion unit and beam blocking unit such that only the central portion of the expanded beam passes through to the substrate, thereby obtaining a uniform intensity distribution while maintaining wide area coverage.
Solution Approach 2:
The patent applies different quality requirements to different regions of the beam. The central region of the expanded beam is utilized for pattern formation due to its high intensity and uniformity, while the peripheral regions are blocked out. This local quality approach ensures that only the optimal portion of the beam contributes to pattern formation, achieving both wide coverage and high uniformity.
2Manufacturing precision
If beam scanning method is used to fabricate uniform pattern over wide area, then the pattern uniformity is improved, but the fabrication time increases requiring many hours for scanning
Solution Approach 1:
The patent performs preliminary beam expansion before the beam reaches the substrate. By expanding the laser beam in advance using a beam expansion unit positioned in the optical path, the system creates a wide-area uniform intensity distribution that can illuminate the entire substrate simultaneously, eliminating the need for time-consuming scanning operations.
3Area of stationary object
If beam is expanded to obtain uniformity over wide range, then the area coverage is improved, but the beam intensity is reduced and exposure time is extended
Solution Approach 1:
The patent extracts the central high-intensity region from the expanded beam and blocks the peripheral low-intensity regions. This extraction process ensures that the full intensity of the central beam region is utilized for pattern formation, maintaining high energy efficiency while achieving wide area coverage through the expanded beam geometry.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances pattern uniformity and reduces fabrication time and costs by ensuring consistent beam intensity across the substrate, overcoming limitations of traditional methods.
Implementation Method 1
a laser for generating a beam
Implementation Method 2
transferring an interference pattern generated due to interference of a laser beam to a substrate by using an optical principle
Implementation Method 3
beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate
Data Source
Figure 1
Figure 2~3
Figure 4
AI summary
The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.