Nanofibril Tip Debris Removal for High Aspect Structures
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current methods for removing debris from substrates with high-aspect ratio structures and photolithography masks during nanomachining often damage the structures due to chemical or mechanical energies, and existing cleaning techniques are not effective in selectively removing nanoparticles without affecting surrounding features.
Innovation Solution
A system utilizing a cantilever arm with a tip and nanofibrils that elastically deform to selectively adhere and remove debris from substrates, employing a low surface energy coating and a patch of low energy material to create a surface energy gradient for preferential adhesion and deposition of debris.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If wet cleaning techniques with chemicals and agitation are used to remove debris, then debris removal effectiveness is improved, but high-aspect ratio structures and mask features are damaged or destroyed
Solution Approach 1:
The patent applies local quality by creating a surface energy gradient where the tip has low surface energy and the substrate has high surface energy. This localized difference in surface properties allows selective adhesion of debris to the tip while leaving the substrate and its delicate high-aspect ratio structures unaffected. The gradient is established through a patch of low energy material positioned near the tip, creating a localized energy landscape that guides debris removal without requiring global chemical or mechanical treatment that would damage sensitive features.
Solution Approach 2:
The patent introduces an intermediary mechanism - the surface energy gradient field - that mediates between the debris and the tip. Instead of directly applying harsh chemicals or mechanical forces to the substrate, the system uses the energy gradient as an intermediate force field that selectively attracts debris to the tip. This intermediary approach allows indirect debris removal, where the gradient acts as a mediator that captures debris from the substrate surface without requiring direct contact or application of damaging energy to the substrate itself.
2Reliability
If standard wet clean technologies are used on EUV masks requiring vacuum environment, then the vacuum must be broken which leads to further particle contamination
Solution Approach 1:
The patent replaces the mechanical/chemical wet cleaning system with a surface energy-based field system. Instead of using liquid chemicals and mechanical agitation that require breaking the vacuum, the invention uses an electrostatic or surface energy field to attract and remove particles. This substitution allows the cleaning process to occur within the vacuum environment, as the field-based mechanism does not require introducing liquids or gases that would contaminate the vacuum. The tip, positioned near the mask surface, uses the energy gradient to capture particles without requiring vacuum breakage.
3Manufacturing precision
If nanomachining is performed to remove material from substrate, then material removal precision is improved, but debris particles are generated and remain on substrate
Solution Approach 1:
The patent implements continuity of useful action by integrating the debris removal function directly into the nanomachining process. Rather than performing material removal and then separately cleaning the substrate, the system continuously removes debris as it is generated during nanomachining. The tip, maintained with low surface energy, continuously attracts and captures particles as they are produced by the machining action, ensuring that the substrate surface remains clean throughout the entire manufacturing process without requiring interruption or separate cleaning steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the effective removal of debris from high-aspect ratio structures without damaging the substrate features, allowing for precise cleaning of nanoparticles by applying energy only to the debris, thereby maintaining the integrity of the surrounding patterns and structures.
Implementation Method 1
the nanofibril being configured to elastically deform against or around the debris or the surface of the substrate
Implementation Method 2
employing a low surface energy coating and a patch of low energy material to create a surface energy gradient for preferential adhesion and deposition of debris
Data Source
AI summary
A system for removing debris from a surface of a substrate, the system including a cantilever arm and a tip supported by the cantilever arm. The tip has a proximal portion and a distal portion such that the tip is supported by the cantilever arm via the proximal portion. The system further includes at least one nanofibril attached to the distal portion of the tip, and the at least one nanofibril is configured to elastically deform against or around the debris or the surface of the substrate.