Nanoimprint Lithography Chamber with Multi-Axis Robot
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Solution Overview
Problem
Current nanoimprint lithography apparatuses face limitations in throughput and overlay accuracy due to the need for transferring the mold and substrate among multiple sites during the imprinting process, leading to mechanical complexity and potential mechanical failures.
Innovation Solution
A system with a chamber equipped with a multi-axis robot and adjustable mold and substrate holders allows for a full cycle of imprinting within a single site, utilizing differential pressure and stage movements for alignment and separation, and employing a seal ring or deformable mold to ensure uniform contact and release.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the mold and substrate are transferred among multiple sites during imprinting, then the imprinting process can be completed, but the mechanical complexity increases and reliability decreases
Solution Approach 1:
The patent combines multiple imprinting operations (alignment, contact, pressing, separation) into a single stationary chamber site. The mold holder and substrate holder remain fixed while the multi-axis robot performs all necessary movements and operations within this unified space, eliminating the need to transfer components between multiple sites and thereby reducing mechanical complexity while maintaining productivity.
Solution Approach 2:
The single chamber site is designed to perform multiple functions: alignment, contact establishment, pressing, and separation. The multi-axis robot provides multi-functional capability by executing different operations within the same stationary chamber, making the system more versatile and reducing the need for multiple specialized sites.
2Productivity
If the mold and substrate are transferred among multiple sites, then the imprinting process can be completed, but potential mechanical failures increase
Solution Approach 1:
By merging all imprinting operations into a single stationary chamber, the patent eliminates multiple transfer interfaces and mechanical coupling points that could fail. The fixed mold holder and substrate holder reduce the number of moving components and potential failure points while maintaining the complete imprinting workflow.
3Manufacturing precision
If electron beam lithography is used to create patterns, then nanoscale patterns can be written, but the writing speed is very slow
Solution Approach 1:
The patent uses a pre-made mold that contains the nanoscale patterns as a physical copy or master template. Instead of writing patterns directly onto the substrate using slow electron beam lithography, the system replicates the pre-formed patterns from the mold onto the substrate through imprinting, dramatically increasing productivity while maintaining nanoscale precision.
4Manufacturing precision
If the mold is pressed against the substrate with high pressure, then pattern transfer fidelity improves, but the separation becomes more difficult
Solution Approach 1:
The patent employs dynamic control of the pressing and separation process. The mold holder and substrate holder can be independently positioned and moved along the vertical axis, allowing for controlled pressing at high pressure for accurate pattern transfer, followed by controlled separation by reversing the pressure differential. This dynamic control enables both high pattern fidelity and easy separation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances throughput and reliability by reducing mechanical complexity and improving pattern transfer fidelity, enabling high-pressure and high-vacuum operations within the chamber for efficient nano-scale pattern replication.
Implementation Method 1
The chamber is capable of achieving vacuum or pressure inside
Implementation Method 2
The substrate and mold can be pressed further by introducing higher pressure inside the chamber
Implementation Method 3
the polymer is transited from deformable or flowable into rigid by UV radiation
Data Source
AI summary
A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.