Nanoimprint Film Curing via Segmented Radiation and Offset Template
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Solution Overview
Problem
Nanoimprint lithography faces challenges in controlling the polymerization factor (PNF) of actinic radiation on mesa sidewalls to prevent extrusion defects while ensuring adequate curing of the formable material under the template and adjacent to the sidewalls, which affects the quality of the shaped film and yield of articles.
Innovation Solution
The method involves optimizing imprint parameters, such as drop pattern and radiation exposure, to control the PNF on mesa sidewalls, using a combination of actinic radiation patterns and offset template positions to minimize radiation exposure on sidewalls while ensuring sufficient curing of the formable material, thereby reducing extrusion defects and improving film quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If actinic radiation is applied to cure the formable material under the template, then the curing of the formable material is improved, but extrusion defects occur on the mesa sidewalls due to excessive radiation exposure
Solution Approach 1:
The patent applies different radiation exposure levels to different regions of the formable material. The area under the template receives sufficient radiation for proper curing, while the mesa sidewalls receive limited exposure to prevent extrusion defects. This spatial differentiation of radiation dosage resolves the contradiction between achieving adequate curing and preventing harmful extrusions.
Solution Approach 2:
The curing process is divided into two distinct stages: first curing the formable material while the template is in the initial position, then offsetting the template to a second position to cure any remaining material. This segmentation allows selective curing of different regions, preventing excessive exposure of the mesa sidewalls while ensuring complete curing of the formable material.
2Object-generated harmful factors
If the template is offset to reduce radiation exposure on sidewalls, then extrusion defects are reduced, but the curing of formable material adjacent to sidewalls may be insufficient
Solution Approach 1:
The curing process is divided into two sequential steps: first curing with the template in the initial position, then offsetting the template to a second position for additional curing. This segmented approach ensures that the formable material receives sufficient total radiation exposure while the mesa sidewalls are protected from excessive continuous exposure that causes extrusion defects.
Solution Approach 2:
The first curing step is performed as a preliminary action before offsetting the template. This initial curing establishes a foundation of cured material that prevents extrusion defects, while the subsequent offset position provides additional curing for any remaining uncured material adjacent to the sidewalls.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces extrusion defects on the mesa sidewalls, maintaining high-quality film formation and article yield by optimizing radiation exposure and template positioning, ensuring adequate curing without excessive sidewall exposure.
Implementation Method 1
The radiation source may be configured to form a cured layer within the first imprint field while the shaping surface is in contact with the formable material by curing a first portion of the formable material
Data Source
AI summary
Systems and methods for shaping a film. Formable material in an imprint field on the substrate may be contacted with a shaping surface of a template. Outer boundaries of the imprint field correspond to outer boundaries of the shaping surface. Shaping the film includes forming a cured layer within the imprint field while the shaping surface is in contact with the formable material. Shaping the film may include separating the shaping surface from the cured layer. Shaping the film may include moving the template away from the imprint field to a first offset location wherein the outer boundaries of the shaping surface are offset relative to the outer boundaries of the imprint field. Shaping the film may include curing a second portion of the formable material while the template is at the first offset location so as to form the shaped film.