Nanoimprint Drop Pattern Generation for Substrate Alignment
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Solution Overview
Problem
Current nanoimprint lithography techniques face challenges in generating precise drop patterns for substrates with varying geometries and pattern positions, leading to inefficiencies and defects during the imprinting process due to geometry variations and misalignment of substrates and templates.
Innovation Solution
A method for generating drop pattern information that accounts for the measured state of a substrate relative to a reference state, including offset information and border region characteristics, to determine the positions of droplets of formable material that fill the volume between the template and substrate without spreading into border regions, using full and partial field drop patterns that are adjusted based on substrate topography and template alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a uniform drop pattern is used for all substrates, then the process is simple to implement, but manufacturing precision deteriorates due to substrate geometry variations and misalignment
Solution Approach 1:
The patent applies local quality by customizing drop patterns for different substrates based on their specific geometry and pattern position. Instead of using a uniform drop pattern for all substrates, the system generates substrate-specific drop patterns that account for variations in substrate geometry, pattern location, and alignment. This ensures optimal formable material distribution for each substrate, maintaining high manufacturing precision while adapting to local variations.
Solution Approach 2:
The patent implements parameter changes by dynamically adjusting drop pattern parameters (such as drop positions, volumes, and spacing) based on measured substrate characteristics. The system modifies drop pattern parameters according to substrate geometry variations, pattern positions, and alignment measurements, allowing the imprinting process to adapt to different substrates and maintain precision across production batches.
2Reliability
If the template is brought into contact with the substrate to ensure complete filling, then the volume between template and substrate is fully filled, but formable material spreads into border regions causing defects
Solution Approach 1:
The patent applies preliminary action by pre-calculating and pre-positioning drops of formable material according to substrate-specific drop patterns before the imprinting process. The system determines optimal drop locations and volumes in advance, based on substrate geometry and desired fill volume, ensuring that material is placed precisely where needed to fill the imprint volume without spreading into border regions.
Solution Approach 2:
The patent uses local quality by applying different drop patterns to different regions of the substrate. The system identifies border regions and adjusts or eliminates drops in those areas while maintaining adequate filling in the central imprint regions. This localized approach ensures complete filling where needed while preventing material spread into border regions that would cause defects.
3Productivity
If traditional nanoimprint lithography is used without substrate-specific adjustments, then the process is fast and straightforward, but production yield decreases due to defects from geometry variations
Solution Approach 1:
The patent implements preliminary action by performing substrate measurements and generating customized drop patterns before the actual imprinting process. This preparatory step ensures that subsequent imprinting operations can proceed efficiently with pre-optimized parameters, reducing defects and rework while maintaining high production speeds. The system automates the measurement and pattern generation process to minimize overhead time.
Solution Approach 2:
The patent applies feedback by using measured substrate characteristics (geometry, pattern position, alignment) to generate and adjust drop patterns for each substrate. The system incorporates measurement feedback into the drop pattern generation process, allowing real-time adaptation to substrate variations and ensuring high yield by preventing defects before they occur.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables more accurate and efficient imprinting by preventing formable material from spreading into border regions, improving the precision and consistency of pattern transfer, even on substrates with geometry variations and misaligned patterns, thereby enhancing the production yield and reducing defects.
Implementation Method 1
The formable liquid is solidified to form a film that has a shape (pattern) conforming to a shape of the surface of the template that is in contact with the formable liquid
Implementation Method 2
The formable liquid is solidified to form a film that has a shape (pattern) conforming to a shape of the surface of the template
Data Source
AI summary
One embodiment is a method that includes generating drop pattern information. The method may comprise receiving pattern information. The pattern information may include one or both of: a substrate pattern of a representative substrate; and a template pattern of a representative template. The method may further comprise receiving offset information about a particular substrate that is representative of a measured state of the particular substrate relative to a reference state. The drop pattern information may represent a plurality of positions to place droplets of formable material on the particular substrate. The method may further comprise outputting the drop pattern information that is representative of the formable material that fills a volume between the template and the particular substrate that is in the measured state and the formable material does not spread into a border region at an edge of the particular substrate.