Nanoimprint Pattern Layers That Trap Particles Before UV Curing
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Solution Overview
Problem
Existing nanoimprint lithography (NIL) methods for semiconductor manufacturing face challenges in efficiently handling foreign particles, which can lead to template breakage and require additional inspection steps to prevent pattern defects.
Innovation Solution
A pattern forming method involving the use of uncured organic and resist layers with controlled viscosities, where foreign particles are moved into the organic layer during template pressing, followed by curing and etching to form desired patterns without breaking the template, eliminating the need for separate inspection steps.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional NIL methods are used with single-layer curable compositions, then the process is simple, but foreign particles cause template breakage and pattern defects
Solution Approach 1:
The curable composition is divided into two distinct layers: a first layer with a first curable composition and a second layer with a second curable composition. This segmentation allows each layer to serve different functions - the first layer captures foreign particles while the second layer provides the final pattern, thereby preventing template breakage without requiring complex single-layer formulations.
Solution Approach 2:
The first curable composition acts as an intermediary layer between the template and the second curable composition. During the imprinting process, this intermediate layer receives and retains foreign particles through capillary action, preventing them from reaching and damaging the template, thus protecting the template while enabling successful pattern transfer.
2Manufacturing precision
If inspection steps are added to detect foreign particles, then pattern defect prevention improves, but process complexity and time increase
Solution Approach 1:
Instead of inspecting for and removing foreign particles as defects, the method converts their harmful presence into a beneficial function. The first curable composition is designed to actively capture and retain foreign particles during imprinting, transforming the inspection problem into a self-cleaning mechanism that improves pattern quality without adding inspection steps.
Solution Approach 2:
The first curable composition performs the preliminary action of capturing foreign particles before the actual pattern transfer occurs. By pre-positioning the foreign particle capture function in the first layer, the method eliminates the need for subsequent inspection steps, thereby maintaining high manufacturing efficiency while ensuring pattern quality.
3Manufacturing precision
If template pressing force is increased to improve pattern transfer, then pattern fidelity improves, but template breakage risk increases due to foreign particles
Solution Approach 1:
The first curable composition serves as a protective intermediary layer that absorbs pressing forces and captures foreign particles before they can transmit stress to the template. This intermediary structure allows sufficient pressing force to be applied for high-fidelity pattern transfer while preventing template breakage by trapping particles in the first layer.
Solution Approach 2:
The first curable composition provides beforehand cushioning by creating a compliant layer between the rigid template and the substrate. This cushioning layer can deform under pressing force while capturing foreign particles, thereby protecting the template from impact forces that would otherwise cause breakage during high-force pattern transfer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method effectively prevents template breakage and simplifies the manufacturing process by integrating foreign particle handling within the pattern formation, ensuring consistent pattern transfer and reducing process complexity.
Implementation Method 1
pressing a first template having a surface with a pattern against the second layer, to bring the pattern into contact with a foreign matter inside or on a surface of the second layer, thereby moving at least part of the foreign matter into the first layer
Implementation Method 2
applying a first light to the first layer and the second layer through the first template to cure the first layer and the second layer
Data Source
AI summary
A pattern forming method includes: forming a first layer on an object, the first layer containing a first photocurable composition; forming a second layer on the first layer, the second layer containing a second photocurable composition different in composition from the first photocurable composition; pressing a first template having a surface with a pattern against the second layer, to bring the pattern into contact with a foreign matter inside or on a surface of the second layer, thereby moving at least part of the foreign matter into the first layer; and applying a first light to the first layer and the second layer through the first template to cure the first layer and the second layer.