Nanoimprint Composition for Fine Pattern Transfer and Low Haze
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Solution Overview
Problem
Existing nanoimprint materials face challenges in achieving fine pattern transferability, stress resistance during mold release, and reducing haze in visible light regions, particularly in applications like AR glasses and 3D sensors.
Innovation Solution
A nanoimprint composition comprising an unsaturated acid metal salt, a photopolymerizable compound, a photoradical polymerization initiator, and a solvent component, with specific mass ratios, is used to form a photocurable film, press a mold, and peel off to achieve improved stress resistance and reduced haze.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the pattern becomes finer and more complicated, then the pattern transferability is improved, but the stress generated on the nanoimprint material during mold release increases
Solution Approach 1:
The patent changes the chemical composition parameters of the nanoimprint material by incorporating specific ratios of unsaturated acid metal salts (5-20 parts by mass) and photopolymerizable compounds. This parameter change modifies the material's mechanical properties to enhance stress resistance during mold release while maintaining fine pattern transferability.
Solution Approach 2:
The patent creates a composite nanoimprint material system combining unsaturated acid metal salts, photopolymerizable compounds, and photoradical polymerization initiators. This composite formulation synergistically improves both pattern transferability and stress resistance by leveraging the complementary properties of each component.
2Illumination intensity
If metal oxide nanoparticles are blended to achieve high refractive index, then the refractive index is improved, but the haze in visible light region increases
Solution Approach 1:
The patent optimizes the concentration and size distribution parameters of metal oxide nanoparticles within the nanoimprint composition. By controlling these parameters, the material achieves high refractive index while minimizing light scattering that causes haze in the visible region.
Solution Approach 2:
The patent applies local quality control by ensuring uniform dispersion of metal oxide nanoparticles throughout the nanoimprint material matrix. This localized uniformity prevents agglomeration-induced haze while maintaining the desired refractive index properties in the bulk material.
3Strength
If the content of unsaturated acid metal salt is increased to improve stress resistance, then the stress resistance is improved, but the coatability on substrate may be affected
Solution Approach 1:
The patent optimizes the content parameter of unsaturated acid metal salt within a specific range (5-20 parts by mass relative to photopolymerizable compound). This parameter optimization balances stress resistance improvement with maintaining adequate coatability and film formation properties on substrates.
Solution Approach 2:
The patent ensures local quality of film formation by controlling the distribution and concentration of unsaturated acid metal salt within the coating layer. This localized control maintains uniform film properties and good coatability while achieving the desired stress resistance in the cured material.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition ensures satisfactory fine pattern transferability and enhances stress resistance while reducing haze in the visible light region, suitable for applications requiring high refractive index and low haze, such as 3D sensors and AR waveguides.
Implementation Method 1
a component (C) which is a photoradical polymerization initiator
Data Source
AI summary
A nanoimprint composition including an unsaturated acid metal salt (R), a photopolymerizable compound (B), a photoradical polymerization initiator, and a solvent component having compatibility with the unsaturated acid metal salt (R) and the photopolymerizable compound (B), in which a content of the unsaturated acid metal salt (R) is 50 parts by mass or greater with respect to 100 parts by mass of a total content of the unsaturated acid metal salt (R) and the photopolymerizable compound (B).