Nanoimprint Nanopore Membrane Fabrication Using Guided Self-Assembly
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Solution Overview
Problem
Current methods for fabricating nanopores and channels for DNA storage and sequencing face challenges in accurately placing and sizing them small enough to allow single DNA strand passage, necessitating an 8 to 9 order of magnitude improvement in writing speed for DNA storage to be viable.
Innovation Solution
An imprint method using e-beam lithography and guided self-assembly to fabricate synthetic nanopores across a large membrane surface, employing block-copolymers or gold nanoparticles for precise patterning of features less than 2 nm in size.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithography methods are used to fabricate nanopores, then manufacturing simplicity is maintained, but manufacturing precision deteriorates (cannot achieve features less than 2 nm)
Solution Approach 1:
The fabrication process is divided into multiple stages: first forming a guiding layer with larger features using conventional lithography, then using guided self-assembly to create the final sub-2nm nanopore patterns. This segmentation allows each stage to operate at its optimal resolution level.
Solution Approach 2:
A guiding layer is introduced as an intermediary structure that directs the self-assembly process. The guiding layer with its patterned features serves as a template that guides block copolymer or nanoparticle self-assembly to form the final high-precision nanopore array.
2Quantity of substance
If nanopore size is reduced to allow single DNA strand passage, then DNA storage density is improved, but manufacturing precision requirements increase
Solution Approach 1:
The system uses guided self-assembly where block copolymers or nanoparticles automatically organize themselves into precise patterns on the guiding layer. This self-service mechanism achieves atomic-level precision (less than 2 nm) without requiring conventional lithography at that scale.
Solution Approach 2:
The invention changes the fundamental parameter of pattern formation from top-down lithographic writing to bottom-up self-assembly. This parameter change enables precise control of nanopore dimensions through thermodynamic self-organization rather than mechanical patterning.
3Productivity
If DNA writing speed is increased to match disk drive capabilities, then productivity is improved, but manufacturing precision must be enhanced to create sufficient nanopores
Solution Approach 1:
The guided self-assembly process simultaneously achieves multiple functions: it creates high-density nanopore arrays with precise spacing, ensures uniform pore sizes, and enables large-area fabrication. This universal approach supports high productivity by enabling parallel processing of multiple nanopores.
Solution Approach 2:
The invention transitions from one-dimensional linear DNA writing to two-dimensional array-based processing. By creating arrays of nanopores across large membrane surfaces, the system enables parallel DNA storage operations, dramatically increasing effective writing speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the fabrication of high-density nanopore arrays with precise control over feature sizes, enhancing DNA storage and sequencing capabilities by allowing faster data writing and reading.
Implementation Method 1
e-beam lithography
Implementation Method 2
A photoresist layer may be formed on top of the guiding layer and may be patterned and etched to form a guiding pattern
Implementation Method 3
guided self-assembly to fabricate a nanoimprint template. Block-copolymers (BCP) or gold nanoparticles may be used in the self-assembly process
Implementation Method 4
Deposition of a self-assembled monolayer on at least a portion of the guiding template may occur after the patterning step to form a patterned template
Implementation Method 5
the patterned template may be exposed to one or more etch processes to form a nanoimprint lithography template
Implementation Method 6
The resulting nanoimprint lithography template may be used to imprint a membrane to form an array of nanopores in the membrane
Data Source
AI summary
A method of manufacturing a synthetic nanopore device for DNA sequencing disclosed herein includes providing a base template, forming a guiding layer on top of the base template, and forming a photoresist layer on top of the guiding layer. The photoresist layer is patterned, and the guiding layer is etched for form a guiding pattern. The photoresist layer is removed to form a guiding template and a self-assembled monolayer is deposited on at least a portion of the guiding template to form a patterned template. The patterned template is exposed to one or more etch processes to form a nanoimprint lithography template. A membrane is imprinted with the nanoimprint lithography template to form an array of nanopores in the membrane.