Nanoimprint Stamp Formation with Vacuum Support for Pitch Uniformity
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Solution Overview
Problem
Current methods for fabricating optical device structures, such as waveguide combiners and metasurfaces, face challenges in efficiently overlaying virtual images on ambient environments in augmented reality systems, particularly in achieving uniformity and precision in nanoimprint lithography processes.
Innovation Solution
The system comprises a master holder, spacer, and stamp support holder with vacuum channels to retain a stamp support, allowing for the curing of a stamp material to form a cured stamp layer with an inverse optical device pattern, which is then used for nanoimprint lithography to create optical device structures with precise dimensions and uniform pitch.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional nanoimprint lithography methods are used, then the fabrication process can be completed, but the pitch and orientation uniformity of the formed structures deteriorates
Solution Approach 1:
The stamp support is divided into multiple segments or zones with different height levels. This segmentation allows different regions of the stamp to be supported at different heights, compensating for variations in stamp thickness and ensuring uniform contact between the stamp and master across the entire imaging area, thereby achieving consistent pitch and orientation uniformity throughout the fabricated optical device structures
Solution Approach 2:
The stamp support is pre-configured with varying height levels before the nanoimprint process begins. This preliminary action of creating a non-uniform support structure allows the system to proactively compensate for expected variations in stamp thickness, ensuring that the stamp makes uniform contact with the master across all regions before the actual patterning occurs, thus achieving reliable and consistent results
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables the fabrication of optical device structures with sub-micron dimensions and uniform pitch, enhancing the overlay of virtual images on ambient environments in augmented reality systems by ensuring precise and consistent nanoimprint lithography results.
Implementation Method 1
The stamp support holder has a vacuum region operable to be in fluid communication with a vacuum source to retain a stamp support
Data Source
AI summary
A system for nanoimprint lithography includes a master holder, a spacer, and a stamp support. The spacer supports the stamp support as a stamp material is cured to create a stamp. A method of forming an optical device using the nanoimprint lithography system with a spacer is provided. A system for the nanoimprint lithography may also include a master and a stamp support holder. The stamp support holder includes a plurality of projections defining a plurality of vacuum channels. The vacuum channels are in fluid communication with a vacuum source to support a stamp support as a stamp material is cured to create a stamp.