Nanoimprint Template Cleaning via Phase Transition
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Solution Overview
Problem
Existing substrate cleaning methods struggle to effectively remove foreign particles of 20 nm or smaller from patterned surfaces in nanoimprint lithography templates, which are crucial for maintaining high cleanliness and preventing particle reattachment during the cleaning process.
Innovation Solution
A substrate cleaning method involving the formation of a liquid film on the patterned surface, followed by solidification into an ice film, and subsequent thawing to remove incorporated particles, utilizing a substrate processing system with mechanisms for liquid application, solidification, and thawing to achieve high cleanliness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional cleaning methods are used, then the cleaning process is simple and fast, but foreign particles of 20 nm or smaller cannot be effectively removed from the patterned surface
Solution Approach 1:
The cleaning method utilizes phase transitions of water (liquid to solid to liquid) to remove particles. A liquid film is formed on the patterned surface, then frozen to solidify the film incorporating particles, and finally thawed to allow particle removal through the phase change process, achieving high cleanliness without complex mechanical cleaning steps
Solution Approach 2:
The cleaning process changes the temperature parameter of the liquid film, transitioning it from liquid state to solid frozen state and back to liquid state. This parameter change enables the incorporation and subsequent removal of sub-20 nm particles that cannot be removed by conventional cleaning methods
2Manufacturing precision
If the substrate is cleaned multiple times to remove particles, then particle removal efficiency improves, but the risk of particle reattachment increases
Solution Approach 1:
The method performs preliminary incorporation of particles into the frozen film before the actual removal step. By freezing the liquid film first, particles are trapped within the solid matrix, preventing them from reattaching to the patterned surface during subsequent handling and cleaning operations
Solution Approach 2:
The phase transition from liquid to solid and back to liquid occurs in a controlled sequence where particles are first incorporated during freezing, then removed during thawing. This sequential phase transition process ensures particles are removed before they can reattach, maintaining both removal efficiency and preventing reattachment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method significantly reduces the number of particles on the patterned surface from 80 per unit area to 3, enhancing the cleanliness of the substrate and preventing particle reattachment, thereby improving the quality of the substrate for semiconductor device production.
Implementation Method 1
the liquid film is solidified to form a solidified film including the foreign particles
Implementation Method 2
the solidified film is melted to remove the foreign particles
Data Source
AI summary
A substrate cleaning method includes: steps (a) to (d). In step (a), a liquid is supplied onto a nanoimprint template substrate that has a patterned surface with foreign particles to form a liquid film on the patterned surface. In step (b), the liquid film is solidified to form a solidified film including the foreign particles. In step (c), the substrate is reversed. In step (d), the solidified film is melted to remove the foreign particles.