Nanoimprint Template Step Structure for Exposure Light Shielding
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Solution Overview
Problem
In nanoimprint lithography, existing templates face challenges in suppressing exposure light leakage to unintended regions during imprinting, particularly due to difficulties in uniformly applying light shielding members on mesa-shaped step structures, leading to unintended curing of resins and inefficiencies in maintaining required pattern heights.
Innovation Solution
A template design featuring a first and second step structure on a base with a light shielding film covering the outer side region of the second step structure, where the light shielding film is formed with a different material than the base, and a high contrast film on the second concave and convex structure body, ensuring effective light shielding and maintaining the required pattern height.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a light shielding member is provided on the side surface of the mesa-shaped step structure, then exposure light leakage is suppressed, but it is difficult to uniformly apply the light shielding member and the production process becomes complex
Solution Approach 1:
The patent transitions from providing light shielding on the side surface (vertical dimension) to providing light shielding on the upper surface (horizontal dimension) of the step structure. This dimensional change allows the light shielding film to be applied uniformly using standard photolithography processes while still effectively blocking exposure light from reaching unintended regions through the step difference.
2Measurement precision
If the step difference of the mesa-shaped step structure is increased to maintain required pattern height, then positioning accuracy is improved, but exposure light can still leak through larger gaps to unintended regions
Solution Approach 1:
Instead of relying solely on increasing the vertical step difference to prevent light leakage, the patent introduces a horizontal light shielding component (light shielding film on the upper surface) that blocks light paths in the horizontal plane, effectively preventing leakage even when step differences are optimized for positioning accuracy rather than maximized for light blocking.
3Force
If the thickness of the template in the transfer pattern region is reduced to facilitate bending for releasing, then releasing force is decreased, but the structural strength and precision are compromised
Solution Approach 1:
The patent divides the template into regions with different thicknesses: a first step structure region with greater thickness for structural support and precision, and a second step structure region with reduced thickness for facilitating bending during releasing. This segmentation allows the template to simultaneously maintain structural integrity where needed and provide easy releasing where required.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses exposure light leakage to unintended regions, preventing resin curing errors and maintaining the required pattern height, while allowing for efficient production of templates without defective or thin film parts in the light shielding film.
Implementation Method 1
a light shielding film covering an outer side region of the second step structure at an upper surface of the first step structure
Data Source
AI summary
A template and a template blank are used for imprint lithography transferring a transfer pattern in a concave and convex structure to a resin on a transfer substrate, in which a first step structure is formed on a main surface of a base, a second step structure is formed on the first step structure, and an outside region of the second step structure on an upper surface of the first step structure is covered with a light shielding film to solve the above problem.