Nanoimprint Template Liquid Repellent Pattern for Resist Leakage
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Solution Overview
Problem
The nano-imprint method faces challenges with resist leakage from the mesa end of templates with mesa structures, leading to large-scale defects and difficulties in resist removal and reworking, especially when using the step and repeat method.
Innovation Solution
The implementation of liquid repellent patterns with bubble trapping and guiding features on the template's peripheral edge, utilizing the lotus effect to prevent resist leakage by trapping gas and guiding the resist flow, thereby preventing it from reaching the mesa end.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a template with a mesa structure is used for nano-imprint, then the template can effectively form fine patterns, but resist leaks out from the mesa end forming large resist structures
Solution Approach 1:
A liquid repellent pattern is introduced as an intermediary layer between the resist and the mesa end. This liquid repellent pattern acts as a mediator that prevents direct contact between the resist and the mesa end surface, thereby stopping the resist leakage while allowing the main pattern formation to proceed effectively.
Solution Approach 2:
The template surface is given different properties in different regions: the mesa surface maintains its pattern-forming quality while the peripheral edge region is modified with a liquid repellent pattern. This local differentiation allows the mesa end to repel resist specifically where leakage occurs, without affecting the overall pattern formation capability.
2Manufacturing precision
If resist leakage occurs at the mesa end, then large resist residues are formed, but this makes resist removal and reworking difficult
Solution Approach 1:
The liquid repellent pattern serves as a barrier that prevents resist from reaching the mesa end, thereby eliminating the formation of large resist residues. This intermediary structure ensures that resist remains confined to the intended pattern areas, making subsequent resist removal and reworking processes much easier and more effective.
3Productivity
If the step and repeat method is used for nano-imprint, then productivity is improved, but leaked resist portions hinder pressing and generate unfilled defects
Solution Approach 1:
The liquid repellent pattern acts as a protective intermediary that prevents resist leakage during repeated imprint operations. By blocking the leakage path at the mesa end, it ensures that each imprint cycle produces complete, defect-free patterns, thereby maintaining high reliability across multiple repetitions.
Solution Approach 2:
The liquid repellent pattern is pre-formed on the template before the imprint process begins. This preliminary preparation ensures that the anti-leakage barrier is already in place, preventing resist leakage before it can occur during the pressing operation, and ensuring consistent results across all imprint cycles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively prevents resist leakage, reduces the formation of large resist residues, and avoids defects during the imprint process, allowing for smoother resist removal and improved template pressing in subsequent imprinting steps.
Implementation Method 1
utilizing the lotus effect to prevent resist leakage by trapping gas
Implementation Method 2
guiding the resist flow, thereby preventing it from reaching the mesa end
Data Source
AI summary
According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.