Nanoimprint Template With Variable Thickness Optical Layers
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Solution Overview
Problem
In semiconductor device manufacturing using nanoimprint lithography (NIL), the precision of fine alignment between the template and the target is compromised due to the reduction in detection signal intensity caused by the miniaturization of patterns and the thinness of optical layers, leading to decreased alignment accuracy.
Innovation Solution
The template design includes a base material with distinct patterns and thicker optical layers in recesses, which maintain detection signal intensity and enhance alignment accuracy by using materials with different refractive indices for the optical layers, ensuring precise alignment through both rough and fine alignment processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the patterns are miniaturized to achieve finer resolution in semiconductor device manufacturing, then the pattern size is reduced, but the detection signal intensity decreases leading to reduced alignment accuracy
Solution Approach 1:
The invention transitions from two-dimensional pattern miniaturization to three-dimensional structure by forming optical layers with different thicknesses in recesses. The alignment marks are given vertical dimension through varying optical layer thicknesses (first optical layer thinner than second optical layer), creating height differences that enhance detection signal intensity without increasing horizontal pattern size.
Solution Approach 2:
Different regions of the alignment mark are given different optical properties through varying optical layer thicknesses. The first region has a thinner optical layer while the second region has a thicker optical layer, creating local quality differences that produce distinct detection signals for rough and fine alignment processes.
2Manufacturing precision
If the optical layers are made thinner to achieve finer patterns, then the pattern resolution is improved, but the detection signal intensity decreases
Solution Approach 1:
The invention compensates for reduced detection signal intensity from thin optical layers by introducing vertical dimension variations. Thicker optical layers in specific regions (second optical layer thicker than first optical layer) create enhanced light reflection and interference effects, generating stronger detection signals for alignment marks.
Solution Approach 2:
The invention changes the thickness parameter of optical layers to optimize detection signal intensity. By forming optical layers with different thicknesses (first thickness for first optical layer, second thickness for second optical layer where second > first), the system achieves both fine pattern resolution and sufficient detection signal intensity.
3Ease of manufacture
If uniform optical layers are used across all patterns, then the manufacturing process is simplified, but the alignment accuracy for different alignment stages is compromised
Solution Approach 1:
The invention applies different optical layer thicknesses to different regions: a first optical layer with first thickness for rough alignment marks, and a second optical layer with second thickness (greater than first) for fine alignment marks. This local differentiation optimizes detection signals for each alignment stage while maintaining a relatively simple manufacturing process through selective formation.
Solution Approach 2:
The optical layer structure is segmented into multiple regions with different thicknesses. The first optical layer and second optical layer are formed as separate segments with distinct thicknesses, allowing optimization of detection signals for different alignment purposes (rough alignment vs. fine alignment) without requiring complete redesign of the entire optical layer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach improves the alignment accuracy between the template and the target by preventing a decrease in detection signal intensity and reducing erroneous detection, thereby maintaining high precision in pattern transfer during semiconductor device manufacturing.
Implementation Method 1
the base material containing a first material having a first refractive index; a first layer disposed in the first recess and containing a second material, the second material having a second refractive index different from the first refractive index
Data Source
AI summary
A template includes: a base material having a surface including a first pattern, a second pattern and a third pattern, the first pattern including a first recess, the second pattern including a second recess. The base material containing a first material having a first refractive index; a first layer disposed in the first recess and containing a second material, the second material having a second refractive index different from the first refractive index; and a second layer disposed in the second recess, containing the second material, and being thicker than the first layer.