Nanoparticle Coating Apparatus with Aperture Arrays
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Solution Overview
Problem
Conventional gas-phase nanoparticle sources are limited to forming deposits over small areas, failing to provide uniform nanoparticle coatings over large surfaces required for applications like write heads or wafers.
Innovation Solution
An apparatus comprising a source of vaporized metal nanoparticles, a first plate with an array of apertures, and a second plate with aligned apertures, along with lenses and skimmers, which focuses and distributes nanoparticles to produce a uniform, large-scale coating on a substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If a conventional gas-phase nanoparticle source is used, then the apparatus is simple in structure, but the coating area is limited to a small region only
Solution Approach 1:
The invention divides the single nanoparticle source into multiple sources arranged in an array configuration. Each source in the array independently deposits nanoparticles onto a specific region of the substrate, collectively covering a large area. This segmentation approach transforms a single-point deposition system into a multi-point parallel deposition system, thereby expanding the coating area from a small region to a large scale while maintaining uniform coating quality across the entire substrate surface.
2Manufacturing precision
If a single nanoparticle source is used, then the apparatus is simple to operate, but the coating uniformity over large area cannot be achieved
Solution Approach 1:
The coating process is segmented into multiple independent deposition zones, each corresponding to a nanoparticle source in the array. Each source deposits material uniformly onto its designated region, and the combination of these uniform regional deposits achieves overall large-area uniformity. This approach is particularly effective for substrates with varying topographies, as each source can be optimized for its specific deposition zone.
Solution Approach 2:
The invention implements local quality optimization by allowing different regions of the substrate to receive nanoparticles from optimally positioned sources. Each source in the array can be independently controlled and optimized for its specific deposition zone, enabling tailored deposition parameters (such as deposition rate, particle size, and flux) for different regions of the substrate, thereby achieving high uniformity across the entire large-area coating.
3Manufacturing precision
If conventional nanoparticle deposition is used, then the process is simple, but the coating thickness varies significantly across the substrate
Solution Approach 1:
The deposition system is segmented into multiple independent source units arranged in an array, where each source contributes to a specific portion of the substrate. This segmentation ensures that each region of the substrate receives a controlled and consistent flux of nanoparticles from its corresponding source, preventing the thickness variations that occur in single-source systems where edge and center regions receive different amounts of material.
Solution Approach 2:
The invention merges multiple deposition streams from arrayed sources into a single uniform coating layer on the substrate. By synchronizing and coordinating the deposition from multiple sources, the system achieves a combined effect where the thickness contributions from each source sum up to produce a uniformly thick coating across the entire substrate area, eliminating the non-uniformity inherent in single-source deposition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the application of uniform nanoparticle coatings over significantly larger areas compared to conventional methods, ensuring consistent thickness and scalability for various substrate sizes and shapes.
Implementation Method 1
Each lens may be aligned with a first aperture of the first plate. The lenses may be selected to focus nanoparticles having predetermined dimensions into the respective first aperture.
Implementation Method 2
Each shell evaporator preferably comprises an elongate heated tube providing an open channel extending therethrough. Shell material is preferably located within the channel of each heated tube.
Data Source
AI summary
The present invention provides an apparatus for forming a uniform, large scale nanoparticle coating on a substrate. The apparatus comprises a source of vaporised metal nanoparticles. The apparatus further comprises a first plate (20) providing an array of spaced apart first apertures (22). The apparatus further comprises a second plate (24) aligned with and spaced apart from the first plate (20). The second plate (24) provides an array of spaced apart second apertures 26. Each second aperture (26) of the second plate (24) is aligned with a first aperture (22) of the first plate (20).