Patterned Nanoparticle Structures Using Mold-Assisted Photopolymerisation
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Solution Overview
Problem
Current manufacturing techniques for patterned structures with sub-micron dimensions are slow, limited to large micron scales, and not scalable, and they are not suitable for manipulating semi-crystalline, crystalline, or conducting compositions at low temperatures.
Innovation Solution
A method involving electromagnetic radiation with a patterned mold and/or mask to manipulate nanoparticle compositions, forming patterned nanostructures with feature sizes below 5 microns using techniques like nanoimprint lithography, enabling high-speed manufacturing and scalability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional subtractive manufacturing techniques are used, then material precision can be achieved, but the process is expensive, wasteful, and limited to certain materials
Solution Approach 1:
The patent replaces traditional mechanical subtractive manufacturing processes with a chemical additive process using sol-gel chemistry. The sol-gel precursor solution is deposited and undergoes chemical transformation to form the desired material structure, eliminating the need for mechanical removal of material and associated waste.
Solution Approach 2:
The patent changes the material state and processing parameters by using sol-gel precursors in solution form that can be deposited as thin films, then transformed through controlled chemical reactions (hydrolysis and condensation) to form the final oxide material. This allows precise control over material composition and structure during the formation process.
2Ease of manufacture
If direct write techniques are used, then additive manufacturing is achieved, but the process is slow and limited to large micron scale dimensions
Solution Approach 1:
The patent transitions from direct write techniques that operate in one dimension (nozzle to substrate) to a spin coating process that utilizes rotational motion to achieve uniform deposition across the entire substrate surface simultaneously. This dimensional approach enables parallel processing of large areas, dramatically increasing productivity.
Solution Approach 2:
The patent performs preliminary mixing of nanoparticle compositions into the sol-gel precursor solution before deposition. This pre-preparation ensures uniform distribution of functional nanoparticles throughout the material, allowing the entire substrate area to be processed simultaneously rather than requiring sequential point-by-point deposition.
3Manufacturing precision
If conventional processing is used, then material formation is achieved, but volume contraction during calcination causes structural distortion
Solution Approach 1:
The patent employs a flexible organic framework formed by the sol-gel matrix that surrounds and supports the inorganic oxide nanoparticles during processing. This organic framework acts as a flexible shell that can accommodate volume changes during calcination, preventing structural distortion while the oxide material forms and densifies.
Solution Approach 2:
The patent creates a composite material system combining organic sol-gel precursors with inorganic oxide nanoparticles. During calcination, the organic component decomposes and provides a controlled matrix for oxide formation, while the nanoparticle composition is designed to minimize volume contraction and maintain structural integrity throughout the transformation process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method allows for the creation of patterned nanostructures with precise feature sizes and high aspect ratios, reducing volume contraction during calcination, and enabling three-dimensional structures with tunable optoelectronic properties.
Implementation Method 1
using electromagnetic radiation in cooperation with a patterned mold and/or mask to manipulate the nanoparticle composition and form the patterned nanostructure
Implementation Method 2
applying a nanoparticle composition to a surface of a substrate, the nanoparticle composition including a plurality of nanoparticles
Data Source
AI summary
Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.