Nanopore Fabrication in Atomically Thin Materials
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Solution Overview
Problem
Current nanoscale fabrication techniques lack the precision and efficiency to produce high-density, monodisperse nanopores in nanometric solid state materials, which are essential for various electronic, biological, and chemical applications, due to the requirement for atomic-level manipulation and the incompatibility with conventional microelectronic fabrication methods.
Innovation Solution
A two-step process for forming nanopores in nanometric materials, involving the creation of nucleation sites followed by controlled nanopore formation using energetic beams or chemical processes, allowing for precise production of nanopores with diameters less than 10 nm and densities of at least 1000/cm², suitable for materials like graphene and other atomically-thin structures.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If conventional microelectronic fabrication processes are used, then manufacturing efficiency and productivity are improved, but manufacturing precision deteriorates (cannot achieve atomic-level precision required for nanometric materials)
Solution Approach 1:
The fabrication process is divided into distinct stages: forming sacrificial nanowires at controlled intervals, selective removal of specific nanowires, and subsequent nanopore formation. This segmentation allows batch processing while maintaining atomic-level precision through controlled nucleation and growth at predetermined locations.
Solution Approach 2:
Sacrificial nanowires are pre-formed at controlled intervals within the nanometric material before nanopore creation. This preliminary structuring enables subsequent selective removal and precise nanopore formation without requiring real-time atomic manipulation during the actual pore creation process.
2Manufacturing precision
If atomic-level manipulation is performed to achieve required precision, then manufacturing precision is improved, but productivity and manufacturing efficiency deteriorate (one-at-a-time fabrication paradigm)
Solution Approach 1:
The process segments nanopore fabrication into discrete steps performed on arrays of structures simultaneously rather than individually. Multiple nanopores are created in parallel across the nanometric material, transforming sequential atomic manipulation into batch processing while preserving precision through controlled nucleation.
Solution Approach 2:
Identical nanopore structures are replicated across multiple locations in the nanometric material through controlled nucleation and growth processes. This copying approach allows precise, monodisperse nanopore arrays to be created simultaneously at many positions without repeating the full fabrication sequence for each individual pore.
3Quantity of substance
If high-density nanopores are produced, then quantity of nanopores is improved, but manufacturing precision deteriorates (difficulty in maintaining monodispersity)
Solution Approach 1:
The process controls nanopore density and uniformity by adjusting parameters such as sacrificial nanowire spacing, removal selectivity, and nucleation conditions. By precisely controlling these parameters, high-density monodisperse nanopore arrays are achieved through a systematic approach rather than random formation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the production of nanometric structures with high-density, monodisperse nanopores, facilitating applications in micro-fluidic and nano-fluidic processes, molecular detection, and controlled reactions, while overcoming the limitations of conventional fabrication methods.
Implementation Method 1
the nanopore formation step comprises directing a beam of particles at the nanometric material, wherein the beam of particles controllably removes only those atoms at the edge of the nanopore nucleation site
Implementation Method 2
the nanopore formation step comprises directing a beam of particles at the nanometric material
Implementation Method 3
the nanopore formation step comprises directing a beam of particles at the nanometric material
Data Source
AI summary
There is provided a nanometric structure that includes a self-supporting nanometric material having a thickness of no more than about 5 nm. A plurality of nanopores is provided in the nanometric material, and the nanopore plurality has a density of at least about 1000 nanopores/cm2. Each nanopore in the plurality of nanopores has a diameter that is no greater than about 10 nm. The plurality of nanopores is monodisperse in diameter with a variation of about ±30%. In a further nanometric structure provided herein there is included a self-supporting nanometric material having a thickness of no more than about 5 nm. A plurality of nanopores in the nanometric material includes at least about 50 nanopores. Each nanopore in the plurality of nanopores has a diameter that is no greater than about 10 nm. The plurality of nanopores is monodisperse in diameter with a variation of about ±30%.