Nanoporous Membrane Columnar Structure PVD Manufacturing
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Solution Overview
Problem
Conventional nanoporous membranes are difficult to reproduce, scale up, and require high process costs due to their complex structure and labor-intensive methods, such as chemical etching or high-energy ion beams, which limit their selectivity and permeability.
Innovation Solution
A nanoporous membrane with a columnar structure is manufactured using semiconductor deposition technology, where the nanopore size is adjusted through etching the lower surface or using seed and nanobead layers, allowing for scalable production at lower temperatures and easier size adjustment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional chemical etching methods are used to form nanopores, then nanopore formation is achieved, but the process becomes labor intensive and requires high process costs
Solution Approach 1:
The patent replaces chemical etching methods with physical vapor deposition (PVD) to form nanoporous membranes. This substitution eliminates the need for complex chemical etching processes, reducing labor intensity and process costs while maintaining nanopore formation capability through controlled deposition of porous materials.
Solution Approach 2:
The patent directly deposits porous materials using PVD techniques to create the nanoporous membrane structure. This approach forms the nanoporous structure in a single deposition process rather than requiring subsequent etching steps, thereby reducing manufacturing complexity and costs while achieving precise nanopore formation.
2Manufacturing precision
If high-energy ion beam methods are used to form nanopores, then nanopore formation is achieved, but the process becomes labor intensive and requires high process costs
Solution Approach 1:
The patent substitutes high-energy ion beam methods with physical vapor deposition. This replacement eliminates the need for expensive and labor-intensive ion beam equipment and operations, achieving nanopore formation through a more cost-effective and scalable PVD process that maintains manufacturing precision.
3Manufacturing precision
If conventional nanoporous membranes with complex structures are used, then nanopore formation is achieved, but selectivity and permeability are reduced
Solution Approach 1:
The patent employs directly deposited porous materials with controlled pore structures through PVD. This method creates membranes with optimized pore configurations that maintain both structural precision and functional performance, achieving high selectivity and permeability by forming uniform nanopores without the complex multi-layer structures of conventional membranes.
Solution Approach 2:
The patent controls nanopore size, distribution, and morphology by adjusting PVD deposition parameters such as deposition rate, substrate temperature, and material composition. This parameter optimization enables precise control over membrane structure to achieve both manufacturing precision and high selectivity-permeability performance.
4Length of stationary object
If micro machining technology is used to manufacture thin nanoporous membranes, then membrane thickness is reduced, but additional etching steps are required
Solution Approach 1:
The patent replaces micro machining technology with physical vapor deposition to manufacture thin nanoporous membranes. This substitution eliminates the need for additional etching steps because the porous structure is formed directly during deposition, reducing the total number of process steps while achieving the required thin membrane dimensions.
Solution Approach 2:
The patent forms the nanoporous structure during the initial deposition process itself, rather than requiring subsequent etching operations. This preliminary formation of the porous structure during deposition reduces process complexity and enables direct fabrication of thin membranes with integrated nanopore features.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enhances reproducibility, reduces process costs, and facilitates integration with micro fluid channels and electronic devices by using PVD or CVD processes without additional etching steps, improving the membrane's selectivity and permeability.
Implementation Method 1
forming a nanoporous thin film having a columnar structure by depositing one of the metallic materials, oxides, nitrides and fluorides on the first protective layer formed in the upper surface of the substrate through a physical vapor deposition (PVD) process
Implementation Method 2
forming a nanoporous thin film having a columnar structure by depositing one of the metallic materials, oxides, nitrides and fluorides on the first protective layer formed in the upper surface of the substrate through the CVD process
Data Source
AI summary
In the present invention, a nanoporous membrane having a columnar structure is manufactured through a deposition technology used in a semiconductor process, and the size of a nanopore is adjusted by etching the lower surface of the manufactured nanoporous membrane or using a seed layer and a nanobead layer so that scaling up is available at a lowered process temperature and the size of the nanopore can be easily adjusted when manufacturing the nanoporous membrane having a columnar structure.