Hybrid Nanosheet Cell Rows for Single-Mask APR Placement

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Solution Overview

Problem

The manufacturing of integrated circuits (ICs) with nanosheet structures is challenging due to the complexity of aligning standard cells with power rails and reference rails, and the need for multiple masks to create point touch patterns, which increases costs.

Innovation Solution

The use of hybrid nanosheet structures with adjusted numbers of nanosheets in adjacent rows, arranged to have a 1× cell height without point touches, allowing for the use of a single immersion mask, thereby reducing manufacturing complexity and costs.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If standard cells are aligned with power rails and reference rails using traditional methods, then manufacturing precision is maintained, but device complexity and manufacturing cost increase due to multiple masks and point touch patterns

Engineering Contradiction:
Improvemanufacturing process simplicityVSAvoidalignment precision
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent segments the nanosheet structure into hybrid configurations where adjacent rows have different numbers of nanosheets (e.g., 2 nanosheets in one row, 3 in the next). This segmentation allows each row to be independently optimized and manufactured without requiring complex point touch patterns, thereby simplifying the manufacturing process while maintaining alignment precision through the inherent structure of the hybrid nanosheet cells

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent transitions from traditional two-dimensional planar alignment to a three-dimensional hybrid nanosheet structure where vertical stacking and horizontal arrangement work together. By utilizing the vertical dimension for nanosheet stacking and the horizontal dimension for row arrangement with varying nanosheet counts, the design achieves precise alignment without requiring multiple masks, thus improving ease of manufacture while maintaining manufacturing precision

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Manufacturing precision

If multiple masks are used to create point touch patterns, then alignment precision is achieved, but manufacturing cost and process complexity increase

Engineering Contradiction:
Improvealignment precisionVSAvoidmanufacturing process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent extracts and eliminates the need for complex point touch patterns by adopting hybrid nanosheet cell structures. By removing the requirement for point touch patterns, the design no longer needs multiple masks for their creation, thereby reducing manufacturing process complexity while maintaining alignment precision through the inherent structure of the hybrid cells

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent changes the structural parameter of nanosheet arrangement from uniform patterns requiring point touches to hybrid patterns with varying nanosheet counts per row. This parameter change in the cell structure allows for simplified manufacturing with fewer masks while achieving the necessary alignment precision through the modified geometric configuration

Inventive Principle:
Principle #35Parameter changes

3Ease of manufacture

If hybrid nanosheet structures with adjusted nanosheet counts are used, then manufacturing cost and process complexity are reduced, but manufacturing precision and alignment accuracy may be compromised

Engineering Contradiction:
Improvemanufacturing process simplicityVSAvoidalignment precision
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent introduces asymmetry in the nanosheet structure by having adjacent rows with different numbers of nanosheets (e.g., 2 in one row, 3 in the next). This asymmetric hybrid configuration simplifies manufacturing by eliminating point touch patterns while maintaining alignment precision through the deliberate asymmetric design that inherently positions power rails and reference rails correctly without requiring additional alignment steps

Inventive Principle:
Principle #4Asymmetry

Data Source

PatentUS12457801B2APR placement for hybrid sheet cells
Publication Date: 2025.10.28 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12457801B2 patent drawing
  • US12457801B2 patent drawing
  • US12457801B2 patent drawing

AI summary

A device including first nanosheet structures each including a first number of nanosheets, second nanosheet structures each including a second number of nanosheets that is different than the first number of nanosheets, and a plurality of rows including first rows and second rows. Where each of the first nanosheet structures is in a respective one of the first rows, each of the second nanosheet structures is in a respective one of the second rows, at least two of the first rows are adjacent one another, and at least two of the second rows are adjacent one another.