3D Nanosheet Memory Cell Structure With Pyramid Contact Nodes

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Solution Overview

Problem

Existing semiconductor technologies face challenges in achieving high memory cell integration and reducing parasitic capacitance in three-dimensional memory devices.

Innovation Solution

A semiconductor device design featuring horizontal and vertical arrangements of nano sheets, pyramid-shaped contact nodes, and vertical conductive lines, along with a supporter structure, to enhance memory cell density and reduce parasitic capacitance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Quantity of substance

If three-dimensional memory cells are stacked to increase memory capacity, then memory cell density is improved, but parasitic capacitance increases

Engineering Contradiction:
Improvememory cell densityVSAvoidparasitic capacitance
Core Design Contradiction:
Quantity of substanceVSObject-generated harmful factors

Solution Approach 1:

The patent transitions from planar to three-dimensional stacking of memory cells, utilizing the vertical dimension to increase memory capacity. Multiple memory cells are stacked vertically to form a three-dimensional array, thereby increasing memory cell density while managing parasitic capacitance through careful spatial arrangement and isolation structures.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The patent divides the memory device into multiple stacked memory cell layers, with each layer containing switching elements, storage elements, and conductive lines. This segmentation allows independent control and isolation of each memory cell layer, reducing parasitic capacitance between adjacent cells while maintaining high integration density.

Inventive Principle:
Principle #1Segmentation

2Quantity of substance

If nano sheets are arranged horizontally and vertically to form memory cells, then memory cell density is improved, but manufacturing complexity increases

Engineering Contradiction:
Improvememory cell densityVSAvoidmanufacturing complexity
Core Design Contradiction:
Quantity of substanceVSDevice complexity

Solution Approach 1:

The patent implements a nested structure where horizontal and vertical conductive lines are intertwined to form a three-dimensional grid. The nano sheets are positioned at intersections of these conductive lines, creating a nested arrangement that maximizes memory cell density while using standardized manufacturing processes for each component layer.

Inventive Principle:
Principle #7Nested doll (Nesting)

Solution Approach 2:

The conductive lines serve multiple functions: they provide electrical connections, define the geometry of memory cells, and act as alignment references for nano sheet positioning. This multi-functionality reduces the number of separate manufacturing steps and simplifies the overall fabrication process despite the complex three-dimensional architecture.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250359119A1Semiconductor device and method for fabricating the same
Publication Date: 2025.11.20 SK HYNIX INC
  • US20250359119A1 patent drawing
  • US20250359119A1 patent drawing
  • US20250359119A1 patent drawing

AI summary

A semiconductor device including high-integrated memory cells and a method for fabricating the semiconductor device is provided. The semiconductor device may include horizontal arrangement of switching elements including nano sheets and horizontal conductive lines surrounding the nano sheets; pyramid-shaped first contact nodes formed on first edges of the nano sheets in the horizontal arrangement; a horizontal arrangement of vertical conductive lines including pyramid portions surrounding the pyramid-shaped first contact nodes, and coupled to the nano sheets in the horizontal arrangement; data storage elements coupled to second edges of the nano sheets in the horizontal arrangement; and a supporter surrounding the vertical conductive lines in the horizontal arrangement.