Nanostructure Thermal Imprinting With Pulsed Photonic Curing

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Solution Overview

Problem

Existing methods for manufacturing structures with nanostructures often introduce defects due to heat transfer during the manufacturing process, which can render the structures unsuitable for high-end applications, especially when precision alignment and thermal stability are critical.

Innovation Solution

A method involving the use of pulsed electromagnetic radiation with specific wavelengths and energy doses to cure a curable material containing inorganic nanoparticles on a substrate, minimizing heat transfer to the substrate and mold, thereby avoiding defects and achieving precise alignment without thermal drift.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If thermal imprinting is used to manufacture nanostructure materials, then the manufacturing process can proceed with conventional heating methods, but heat transfer during the process imparts defects on the nanostructures and causes thermal drift that compromises alignment precision

Engineering Contradiction:

Improvemanufacturing process simplicityVSAvoidnanostructure alignment precision

Core Design Contradiction:

Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent replaces the conventional thermal heating system with a photonic curing system that uses light (electromagnetic radiation) to cure the curable material. This substitution eliminates the thermal field that causes heat transfer, thermal drift, and alignment precision loss, while maintaining the manufacturing process functionality through optical energy delivery.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the energy delivery parameter from thermal energy (conductive/convective heating) to electromagnetic radiation energy (photonic curing). This parameter change allows the curable material to be cured without significant heating of the substrate and mold, thereby preventing thermal drift and maintaining nanoscale alignment precision throughout the manufacturing process.

Inventive Principle:

Principle #35Parameter changes

2Reliability

If conventional thermal heating is applied to cure the material, then sufficient curing can be achieved, but significant heating of the substrate, mold, and material leads to thermal drift and alignment errors

Engineering Contradiction:

Improvecuring effectivenessVSAvoidsubstrate and mold temperature

Core Design Contradiction:

ReliabilityVSTemperature

Solution Approach 1:

The patent substitutes the thermal heating mechanism with a photonic curing mechanism using electromagnetic radiation. This replacement enables effective curing of the curable material while avoiding significant temperature rise in the substrate and mold, thus eliminating thermal drift and maintaining alignment precision.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent employs pulsed electromagnetic radiation delivery rather than continuous heating. This periodic action allows the curable material to receive sufficient energy for curing while providing intervals for heat dissipation, preventing excessive temperature accumulation in the substrate and mold.

Inventive Principle:

Principle #19Periodic action

3Productivity

If thermal imprinting procedures are used, then the manufacturing process can be completed, but defects are imparted on the nanostructures rendering them insufficient for high-end applications

Engineering Contradiction:

Improvemanufacturing throughputVSAvoidnanostructure defect quality

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

The patent replaces the thermal imprinting system with a photonic curing system that uses electromagnetic radiation. This substitution eliminates the thermal field that causes heat transfer and nanostructure defects, enabling high-end applications while maintaining manufacturing productivity through efficient light-based curing.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent converts the potential harm of excessive heating into a benefit by using selective photonic curing. The electromagnetic radiation is absorbed by the curable material to drive curing reactions, while the substrate and mold remain cool due to their transparency or low absorption at the curing wavelength, thereby preventing thermal damage and nanostructure defects.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for the reliable production of mechanically stabilized materials with nanostructures, ensuring minimal thermal impact on the substrate and mold, thus preventing defects and enabling precise alignment to nanoscale dimensions, enhancing the structural integrity and applicability of the materials in sensitive applications.

Implementation Method 1

exposing the curable material and the substrate to pulsed electromagnetic radiation to form the mechanically stabilized material

Methodology Applied

Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS12174533B2Thermal imprinting of nanostructure materials

Publication Date: 2024.12.24 UNIV OF MASSACHUSETTS

AI summary

Various examples disclosed relate to a method of manufacturing a mechanically stabilized material that includes a nanostructure. The method includes providing a curable material disposed on a substrate. The curable material includes inorganic nanoparticles. The method further includes exposing the curable material and the substrate to pulsed electromagnetic radiation to form the mechanically stabilized material.