Sub-wavelength Nanostructured Surfaces for High Haze and Transparency
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Solution Overview
Problem
Conventional techniques for creating high haze and high transparency structures are inefficient and unsuitable for advanced flexible electronic and optoelectronic applications, as they require additional processing steps and large-scale production challenges, and cannot integrate sub-wavelength textures with optoelectronic devices.
Innovation Solution
A mask-less, one-step fabrication method using reactive ion etching to create sub-wavelength nanostructures with a grass-like texture on polymer and glass substrates, allowing for high haze and transparency, and optionally incorporating a transparent conductor or switchable haze properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional techniques such as sand blasting, powder blasting and acid etching are used to create textured glass structures, then high haze and high transparency can be achieved, but the surface features are larger than the wavelength of light and cannot be integrated with optoelectronic devices
Solution Approach 1:
The invention changes the scale parameter of surface features from conventional micrometer-scale textures to nanoscale textures with feature sizes below the wavelength of light. This is achieved through reactive ion etching processes that create grass-like nanostructures with controlled dimensions, enabling both high optical performance and compatibility with optoelectronic devices that require sub-wavelength surface features
2Manufacturing precision
If conventional texturing techniques are used to create large surface features, then high haze and high transparency above 80% cannot be achieved simultaneously, but the fabrication process is simpler
Solution Approach 1:
The invention replaces mechanical texturing methods (sand blasting, powder blasting) with a chemical vapor phase reactive ion etching process. This substitution enables precise control over nanostructure formation, achieving simultaneous high haze and high transparency above 80% through controlled chemical reactions rather than mechanical force, thereby improving manufacturing precision while maintaining processability
Solution Approach 2:
The invention changes the dimensional parameters of surface features to nanoscale dimensions with specific height and width ratios. By controlling the etching depth, feature spacing, and aspect ratio of the grass-like structures, the patent achieves optimized optical properties including haze and transparency both above 80%, demonstrating precise parameter control through the reactive ion etching process
3Manufacturing precision
If additional processing steps and metal masks are used in conventional fabrication methods, then pattern transfer to glass substrate can be achieved, but production time and cost increase for large-scale production
Solution Approach 1:
The invention extracts and eliminates the metal mask step from the conventional multi-step fabrication process. By using direct reactive ion etching without requiring patterned metal masks, the patent simplifies the manufacturing workflow, reduces the number of processing steps, and eliminates associated costs and time requirements while maintaining pattern transfer accuracy through self-organized nanostructure formation
Solution Approach 2:
The invention merges the patterning and texturing steps into a single reactive ion etching process. Instead of separately creating patterns on metal masks and then transferring them to glass substrates through multiple alignment and etching steps, the patent combines these functions into one direct etching process that creates the desired nanostructures in a single operation, thereby improving production efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves high haze and transparency levels above 80%, enabling efficient production for flexible electronic and optoelectronic devices while providing self-cleaning properties and integrating transparent conductors, reducing material thickness and production costs.
Implementation Method 1
A mask-less, one-step fabrication method using reactive ion etching to create sub-wavelength nanostructures with a grass-like texture
Implementation Method 2
Light scattering is the process of changing the direction of light rays from their straightforward path. Rough surfaces scatter light to a greater degree than planar surfaces. Diffraction, refraction and reflection are the physical mechanisms in the light scattering process.
Data Source
AI summary
The invention relates generally to optically high transparency and high haze structures and, more particularly, to plastic, e.g., polymer, and glass structures having a sub-wavelength texture formed on a surface thereof, which is effective to impart the optical properties of high transparency and high haze to the structures. The texture is in a grass-like or needle-like form. Additionally, the optically high transparency and high haze structures may include a transparent conductor. Furthermore, the glass structures may exhibit a self-cleaning function.